Results 131 to 140 of about 204 (157)
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A model for negative bias temperature instability (NBTI) in oxide and high /spl kappa/ pFETs 13/spl times/-C6D8C7F5F2

Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004., 2004
A model for the negative bias temperature instability (NBTI) is proposed. Unlike previous empirical models, this model is derived from physics principles. The model attributes NBTI to de-passivation of SiO/sub 2//Si interface and its two distinguishing features are: application of statistical mechanics to calculate depassivated site density increase ...
S. Zafar   +4 more
openaire   +1 more source

Charge Trapping, Negative Bias Temperature Instability (NBTI) and Breakdown related Reliability Issues in High k /Gate Dielectric Stacks

ECS Meeting Abstracts, 2006
Abstract not Available.
Sufi Zafar   +5 more
openaire   +1 more source

A Generalized Reaction–Diffusion Model With Explicit H– $\hbox{H}_{2}$ Dynamics for Negative-Bias Temperature-Instability (NBTI) Degradation

IEEE Transactions on Electron Devices, 2007
In this paper, negative-bias temperature-instability (NBTI) modeling, based on a generalized reaction-diffusion framework, is presented. Unlike the previous models, the release of atomic hydrogen from the Si-H bonds at the Si/oxide interface and its subsequent conversion into molecular H2 are considered without the (unphysical) assumption of ...
Haldun KflogluKufluoglu   +1 more
openaire   +1 more source

Negative bias temperature instability (NBTI) experiment

2012
The phenomenon known as Negative Bias Temperature Instability (NBTI) impacts the operational characteristics of Complementary Metal Oxide Semiconductor (CMOS) devices, and tends to have a stronger effect on p-channel devices. This instability is observed with an applied "on" biasing during normal operation and can be accelerated with thermal stress.
openaire   +1 more source

A fast extraction method of negative bias temperature instability (NBTI) generated permanent defects activation energy using temperature step stress

Semiconductor Science and Technology
Abstract With the migration of semiconductor manufacturing technology, the challenge of negative bias temperature instability (NBTI) becomes increasingly important and must be considered during the circuit design stage as so-called design technology cooptimization.
Rui Gao   +9 more
openaire   +1 more source

Annealing Dependence of Negative Bias Temperature Instability (NBTI) in 4H-SiC MOSFETs

Journal of Nanoelectronics and Optoelectronics, 2017
Sang-Mo Koo   +4 more
openaire   +1 more source

Modeling of Negative Bias Temperature Instability (NBTI) for Gate-All-Around (GAA) Stacked Nanosheet Technology

2024 IEEE International Reliability Physics Symposium (IRPS)
Leitao Liu   +9 more
openaire   +1 more source

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