Results 51 to 60 of about 204 (157)
Design of Negative Bias Temperature Instability (NBTI) Tolerant Register File
Degradation of transistor parameter values due to Negative Bias Temperature Instability (NBTI) has emerged as a major reliability problem in current and future technology generations. NBTI Aging of a Static Random Access Memory (SRAM) cell leads to a lower noise margin, thereby increasing the failure rate.
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GaN-HEMTs on silicon (Si) or SiC or sapphire substrates are growing in popularity and is expected to completely transform the power electronics industry. Although GaN HEMTs operate in D-Mode by default, E-Mode operation is necessary for ease of IC design,
J. Ajayan +4 more
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Reliability management is one of the primary concerns in manycore systems design. Different aging mechanisms such as Negative-Bias Temperature Instability (NBTI), Electromigration (EM), and thermal cycling (TC) can reduce the reliability of these systems.
Fatemeh Hossein-Khani +2 more
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Negative-bias temperature instability (NBTI) characterization of MOSFETS employing decoupled-plasma-nitrided gate oxides [PDF]
MASTER OF ENGINEERING (EEE)
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This work presents GaN-on-Si metal–insulator–semiconductor high-electron-mobility transistors (MIS-HEMTs) featuring a quaternary InAlGaN barrier and gate field plate (GFP) for power device applications.
Shivendra Kr. Rathaur +4 more
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A Reinforcement Learning-Based Task Mapping Method to Improve the Reliability of Clustered Manycores
The increasing scale of manycore systems poses significant challenges in managing reliability while meeting performance demands. Simultaneously, these systems become more susceptible to different aging mechanisms such as negative-bias temperature ...
Fatemeh Hossein-Khani, Omid Akbari
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Device reliability challenges for modern semiconductor circuit design – a review [PDF]
Product development based on highly integrated semiconductor circuits faces various challenges. To ensure the function of circuits the electrical parameters of every device must be in a specific window.
C. Schlünder
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SiGe, characterized by high hole mobility, excellent negative bias temperature instability (NBTI) resistance, and flexible threshold-voltage tunability, exhibits significant potential for sub-5 nm p-type field-effect transistors (pFETs).
Yiran LIN, Choonghyun LEE
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CFET Beyond 3 nm: SRAM Reliability Under Design-Time and Run-Time Variability
This work investigates the reliability of complementary field-effect transistors (CFETs) by addressing both design-time variability arising from process variations and run-time variability due to temperature and aging effects.
Sufia Shahin +5 more
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Negative Bias Temperature Instability (NBTI) Monitoring and Mitigation Technique for MOSFET
Thesis or Dissertation ...
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