Optical proximity correction - Open Access .click

SPIE Proceedings, 2003
Standard industry practice in model-based optical proximity correction is to use a single-stage model in which mask, optical projection, resist, and etch effects are lumped together [J.P. Stirniman, M.L. Rieger, SPIE Proc. Optical/Laser Microlithography X, Vol.
Michael L Rieger
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Optical Proximity Correction, Methodology and Limitations

2021 China Semiconductor Technology International Conference (CSTIC), 2021
Since the early 2000's, model based Optical Proximity Correction (MB-OPC) has been used by the semiconductor industry to improve the linewidth uniformity and pattern fidelity in photolithography. Designed to be improved from its predecessor, the rule based OPC (RB-OPC), which relies on a table of biases to correct linewidth variation due to Optical ...
Yongqiang Hou, Qiang Wu
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Application of optical proximity correction technology

Science in China Series F: Information Sciences, 2008
zbMATH Open Web Interface contents unavailable due to conflicting licenses.
Yici Cai +4 more
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Optical proximity correction (OPC)

Proceedings of the 41st annual Design Automation Conference, 2004
As the technology migrates into the deep submicron manufacturing(DSM) era, the critical dimension of the circuits is getting smaller than the lithographic wavelength. The unavoidable light diffraction phenomena in the sub-wavelength technologies have become one of the major factors in the yield rate.
Li-Da Huang, Martin D. F. Wong
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computational lithography

machine learning
inverse lithography technology
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optical proximity correction opc
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lithography