Results 201 to 210 of about 19,199 (250)

Optical proximity correction by e-beam over-correction

Microelectronic Engineering, 1999
Proximity correction mechanism in e-beam systems can be explored to correct optical proximity effect in resist. Using a Hitachi HL-800 e-beam mask writer, we demonstrate optical proximity correction (OPC) for [email protected] attenuated phase-shifting contact holes with duty ratios from 1:1 to 1:5, for various optical settings and resist systems. This
C.H. Lin, S.D. Tzu, Anthony Yen
openaire   +1 more source

Process dependencies of optical proximity corrections

SPIE Proceedings, 2001
Optical Proximity Correction has emerged as an industry standard technique to reproduce the desired shapes on wafers as pattern dimensions are approaching the optical resolution limits. However secondary effects, if not properly controlled, may impede successful application of this technique.
Franz X. Zach, Donald J. Samuels, Alan C. Thomas, Shahid A. Butt   +3 more
openaire   +1 more source

Thermal treatment for optical proximity correction

Microelectronic Engineering, 2007
For 32-nm technology node, thermal treatment is one of the process extension techniques with 193-nm ArF lithography equipment and chemically-amplified resist (CAR). However, it is difficult to use these techniques in the manufacture process because the optical proximity effect of thermal effects is quite severe.
openaire   +1 more source

Adaptive Optical Proximity Correction Using an Optimization Method

7th IEEE International Conference on Computer and Information Technology (CIT 2007), 2007
This paper proposes a new approach to the optical proximity correction (OPC) method which reduces OPC calculation loads by employing an optimization method. OPC is a method of correcting for a mask pattern to improve the fidelity of an image pattern on a silicon wafer.
Tetsuaki Matsunawa, Hirokazu Nosato, Hidenori Sakanashi, Masahiro Murakawa, Eiichi Takahashi, Tsuneo Terasawa, Toshihiko Tanaka, Osamu Suga, Tetsuya Higuchi   +8 more
openaire   +1 more source

Improvement of YX42° Cut LiTaO3 SAW Filters with Optical Proximity Effect Correction Method

Micromachines, 2023
Xing Han, , Yushuai Liu
exaly  

Fast pixel-based optical proximity correction based on nonparametric kernel regression

Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2014
Yanqiu Li, Xu Ma, Shangliang Jiang
exaly  

Optical Proximity Correction

2015
openaire   +1 more source

Improvement of optical proximity-effect correction model accuracy by hybrid optical proximity-effect correction modeling and shrink correction technique for 10-nm node process

Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2016
Scott Halle, Nicole Saulnier, Shoji Hotta   +2 more
exaly  

Optical proximity correction with hierarchical Bayes model

Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2016
Bei Yu, David Z Pan, Tetsuaki Matsunawa   +2 more
exaly  

PV-Aware Analog Sizing for Robust Analog Layout Retargeting with Optical Proximity Correction

ACM Transactions on Design Automation of Electronic Systems, 2018
Xuan Dong, Lihong Zhang
exaly