Results 211 to 220 of about 20,720 (256)

Applications of enhanced optical proximity correction models

SPIE Proceedings, 1998
The accurate prediction of relevant optical and other processing effects is the essential first element of optical proximity effect (OPC) methodologies. A quasi-empirical modeling technique has been devised. Starting from standard aerial-image energy deposition, an exponential transfer function is employed to account for saturation effects.
Jack Q. Zhao, Joseph G. Garofalo, James W. Blatchford, Edward Ehrlacher, Ellis Nease   +4 more
openaire   +1 more source

0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling

Journal of Vacuum Science & Technology B, 1998
Kurt Ronse
exaly  

Optical Proximity Correction

2015
openaire   +1 more source

Optical Proximity Correction (OPC)

2009
openaire   +1 more source

A fast and manufacture-friendly optical proximity correction based on machine learning

Microelectronic Engineering, 2017
Yanqiu Li, Xu Ma, Shangliang Jiang
exaly  

Improvement of optical proximity-effect correction model accuracy by hybrid optical proximity-effect correction modeling and shrink correction technique for 10-nm node process

Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2016
Nicole Saulnier, Shoji Hotta, Keiichiro Hitomi   +2 more
exaly  

Source imperfection impacts on optical proximity correction Available to Purchase

Journal of Vacuum Science & Technology B, 2016
Lawrence S Melvin, Chander Sawh
exaly  

Fast optimization of defect compensation and optical proximity correction for extreme ultraviolet lithography mask

Optics Communications, 2019
Sikun Li, Xiangzhao Wang
exaly  

Fast aerial image simulations using one basis mask pattern for optical proximity correction

Journal of Vacuum Science & Technology B, 2011
Shiyuan Liu, Chuanwei Zhang
exaly  

Optical proximity correction method and system

2018
WAN JINYIN, WANG JINHENG, ZHANG LEI, CHEN JIE   +3 more
openaire   +2 more sources