Results 241 to 250 of about 80,998 (291)
Some of the next articles are maybe not open access.

P-GaN∕ZnO nanorod heterojunction LEDs—effect of carrier concentration in p-GaN

AIP Conference Proceedings, 2011
We studied the effect of carrier concentration in p‐GaN substrate on the performance of p‐GaN/n‐ZnO nanorod heterojunction LEDs. ZnO nanorods were electrodeposited on commercial p‐GaN wafers in a two electrode system from aqueous solutions of zinc nitrate and hexamethylenetetramine.
A. M. C. Ng   +7 more
openaire   +2 more sources

High-performance reverse blocking p-GaN HEMTs with recessed Schottky and p-GaN isolation blocks drain

Applied Physics Letters, 2021
In this Letter, the p-GaN high electron mobility transistor (HEMT) with hybrid drain of recessed Schottky (RS) and p-GaN isolation blocks' drain (HSP drain) is proposed and fabricated for good reverse blocking capability. The related operation mechanism has been investigated and revealed.
Haiyong Wang   +9 more
openaire   +1 more source

Plasma damage in p-GaN

Journal of Electronic Materials, 2000
The effect of Inductively Coupled Plasma H2 or Ar discharges on the breakdown voltage of p-GaN diodes was measured over a range of ion energies and fluxes. The main effect of plasma exposure is a decrease in net acceptor concentration to depths of 400–550 A.
Cao, X. A.   +8 more
openaire   +1 more source

Schottky Barriers on p-GaN

MRS Proceedings, 1995
ABSTRACTSchottky barriers were formed on p-GaN. p-GaN layers doped with Mg were grown by metalorganic chemical vapor deposition (MOCVD). 6H-SiC wafers were used as substrates. The barriers were made by vacuum thermal evaporation of Au. Capacitance-voltage (C-V) and current-voltage (I-V) characteristics of the barriers were investigated.
N.I. Kuznetsov   +3 more
openaire   +1 more source

Si diffusion in p-GaN

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2004
The characteristics of p-type Mg-doped GaN films diffused with Si are studied. N-type conductivity is achieved, and the carrier mobility of diffused GaN is 90–150 cm2 V−1 s−1, higher than that of p-GaN but less than that of epitaxially grown n-GaN. The Mg acceptor states could become deep compensating defects, and the compensation ratio NA/ND is 0.3, 0.
C. J. Pan   +4 more
openaire   +1 more source

Post-growth enhancement pf p-GaN conductivity

The 17th Annual Meeting of the IEEELasers and Electro-Optics Society, 2004. LEOS 2004., 2004
The paper reports on the investigation an improvement of the p-type conductivity of Mg-doped GaN by creating Ga-vacancies in the lattice.
Karouta, F.   +3 more
openaire   +2 more sources

Ohmic contacts on p-GaN (Part I):

Materials Science in Semiconductor Processing, 2001
Abstract The changes in contact resistivity and I–V curve linearity after annealing of Pd, Ni/Au, Cr/Au, Co/Au, Pt and Au contacts on p-GaN after tempering below and above 500°C have been investigated. CTLM-layered structures on p-GaN were thermally stressed and electrically analyzed.
Roland Wenzel   +2 more
openaire   +1 more source

Electrical Transport Properties of p-GaN

Japanese Journal of Applied Physics, 1996
Electrical transport properties of Mg-doped p-GaN grown by organometallic vapor phase epitaxy were studied between 100 and 700 K. Calculations using Fermi-Dirac statistigs were carried out, identifying the majority carrier to be holes over the whole temperature range considered. The acceptor level is 0.17 ± 0.01 eV.
Hisashi Nakayama   +5 more
openaire   +1 more source

ZnO Nanowire/p-GaN Heterojunction LEDs

MRS Proceedings, 2007
AbstractThis article reports forward and reverse biased emission in vertical ZnO nanowire/p-GaN heterojunction light emitting diodes (LEDs) grown out of solution on Mg-doped p-GaN films. The electroluminescence spectra under forward and reverse bias are distinctly different. Forward bias showed two peaks centered around 390 nm and 585 nm, while reverse
Heiko O. Jacobs   +3 more
openaire   +1 more source

Neutron irradiation effects in p-GaN

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2006
Electrical properties, admittance, and microcathodoluminescence spectra are compared for p-GaN samples grown by hydride vapor phase epitaxy (HVPE) and by molecular beam epitaxy (MBE). The former are characterized by a high 300K hole concentration and a weak temperature dependence of conductivity.
A. Y. Polyakov   +12 more
openaire   +1 more source

Home - About - Disclaimer - Privacy