Results 151 to 160 of about 6,644,773 (301)

Bayesian Optimization for the Formation of Vertically Oriented Silicon Structures Using Langmuir-Blodgett Colloidal Lithography and Plasma Chemical Etching. [PDF]

ACS Omega
Osipov A, Fumina A, Belyanov I, Speshilova A, Endiiarova E, Gerdt A.   +5 more
europepmc   +1 more source

Recent Advances in Transparent Microelectrode Device Architecture and Fabrication Strategies for Biomedical Applications

Advanced Materials Technologies, EarlyView.
Transparent microelectrode arrays enable simultaneous optical and electrical electrophysiology with high spatiotemporal resolution, allowing multimodal observations of dynamic biological systems. Advances in materials and device architectures improve device performance by addressing key trade‐offs between optical transparency, impedance, and ...
Michael Abraham Listyawan, Tran Bach Dang, Chi Cong Nguyen, Yee Lap Pong, Tianruo Guo, Thanh Nho Do, Hoang‐Phuong Phan   +6 more
wiley   +1 more source

Plasma chemical etching of gallium arsenide in chlorine

, 2000
One of the most promising methods, used for the examination of the kinetics and determination of the moments of the start and completion of the processes of plasma chemical etching of a wide range of inorganic materials is optical emission spectroscopy ...
Ovchinnikov, N., Svetsov, V., Efremov, A., Riecansky (V.E.) Technical Translations, Cambridge (United Kingdom)   +3 more
core  

Induced Hydrophilicity and Oxidation of β‑Iron Disilicide Films by Varying Ar Plasma Etching Durations. [PDF]

ACS Omega
Borwornpornmetee N, Kardkaew T, Sansit R, Kaewsai C, Srisom K, Phatthanakun R, Janphuang P, Nakajima H, Paosawatyanyong B, Yoshitake T, Promros N.   +10 more
europepmc   +1 more source

Wafer‐Scale Top‐Down Patterning of Metal Halide Perovskites

Advanced Materials Technologies, EarlyView.
Wafer‐scale patterning of metal halide perovskite films is demonstrated on 150 mm substrates using a chemically amplified resist, polymethyl methacrylate (CAR‐PMMA) and a single reactive ion etching step. The streamlined process preserves film luminescence while defining submicrometer features across the full wafer, enabling dense, scalable integration
Federico Fabrizi, Ardeshir Esteki, Holger Lerch, Saeed Goudarzi, Liudmila Starodubtceva, Gerhard Müller‐Newen, Maryam Mohammadi, Max C. Lemme   +7 more
wiley   +1 more source

Hybrid Laser-Etching Fabrication of High-Density Antireflective Microstructures on DLC-Coated Silicon Using Burst-Mode Bessel Beam Processing. [PDF]

Nanomaterials (Basel)
Sedao X, Prada-Rodrigo J, Cavanna A, Bunea IA, Gonon A, Ravisy W, Bleu Y, Seassal C, Jourlin Y, Dubost L, Crespo-Monteiro N, Stoian R, Di Maio Y, Deeb C, Verrier I, Gamet E.   +15 more
europepmc   +1 more source

Deterministic Transferable Planar Dielectric Mirrors for Investigating Strong Light–Matter Coupling

Advanced Optical Materials, EarlyView.
Transferable dielectric distributed Bragg reflectors enable the deterministic assembly of high‐quality planar microcavities while maintaining the intrinsic properties of quantum materials during fabrication. The resulting structures exhibit robust exciton‐photon coupling in monolayer WS2${\rm WS}_{2}$ from cryogenic to room temperature, establishing a ...
Atanu Patra, Subhamoy Sahoo, Johannes Düreth, Simon Betzold, Sven Höfling   +4 more
wiley   +1 more source

Plasma Functionalization of Carbon-Based Materials for Electrocatalytic Applications. [PDF]

Materials (Basel)
Wieczorek J, Lobato Peralta DR, Stelmachowski P.   +2 more
europepmc   +1 more source

Controlling Polystyrene Particle Distribution in Colloidal Lithography For Correlated‐Disorder Structures

Advanced Optical Materials, EarlyView.
Colloidal lithography is a low‐cost, simple and scalable technique to fabricate correlated‐disorder nanostructures for light‐trapping in solar cells. This work investigates the control of polystyrene particle distribution in colloidal lithography, highlighting the importance of particle surface functionalization as well as the ability to tune the ...
Laura de Almeida, Jean‐Baptiste Doucet, Mathieu Arribat, Guilhem Almuneau, Stéphane Collin, Inès Revol   +5 more
wiley   +1 more source

Microscopic Mechanism of Glass Surface Activation, Annealing and Etching on Glass-Ti/Cu Interfacial Adhesion. [PDF]

Micromachines (Basel)
Shi T, Yang W, Li Q, Yang J, Li Z, Hong H, Zhang Z, Zhang G, Chang AC.   +8 more
europepmc   +1 more source