Results 201 to 210 of about 5,812,653 (293)

Tamper‐Responsive Physical Unclonable Functions via Graphene‐Interlayered Block Copolymer Random Structures

Advanced Materials, EarlyView.
Self‐invalidating multilayer physical unclonable functions (PUFs) integrate fingerprint‐like metal nanopattern bilayers from block copolymer templates with highly reactive reduced graphene oxide (rGO) interlayers. This tamper‐responsive architecture blocks all unauthorized physical and chemical replication attempts while autonomously deactivating ...
Gyu Hui Jo, Dae Hui Park, Jeong‐Ho Jang, Woo Seok Tack, Jin Man Kim, Hak Ki Yu, Hyeong Min Jin, Jang Hwan Kim   +7 more
wiley   +1 more source

Plasmon‐Enhanced Second‐Harmonic Generation in Atomically Thin Crystalline Silver Nanostructures

Advanced Materials, EarlyView.
Atomically thin crystalline silver films combine vertical quantum confinement with lateral plasmonic field enhancement to boost second‐harmonic generation. Nanoribbon and nanotriangle arrays enable geometry‐tunable infrared plasmon resonances, producing strong SHG from deeply subwavelength metallic volumes compatible with silicon‐based nanophotonics ...
Saad Abdullah, Philipp K. Jenke, Andrew P. Weber, Álvaro Rodríguez Echarri, Vahagn Mkhitaryan, Fadil Iyikanat, Frederik Schiller, Philip Walther, J. Enrique Ortega, Lee A. Rozema, F. Javier García de Abajo   +10 more
wiley   +1 more source

Reactivity‐Guided Janus Graphene With Asymmetric Interfacial Electrostatics for Tunable Charge Transport

Advanced Materials, EarlyView.
Stepwise dual‐side functionalization creates covalent Janus graphene with chemically and electrostatically asymmetric interfaces. The resulting nonadditive surface‐potential response and pronounced charge‐transport modulation demonstrate a versatile route for tailoring the electronic properties of graphene.
Shishi Liu, Zhuting Hao, Mira Kreßler, Oguzhan Yücel, Lotte Polling, Adrián Dewambrechies, Wesley Pietsch, Philip Nickl, Felix Fels, Kevin Pagel, Markus R. Heinrich, Patryk Kusch, Kirill Bolotin, Xin Chen, Siegfried Eigler   +14 more
wiley   +1 more source

Edge-Site Nanoengineering of WS₂ by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution. [PDF]

Chem Mater, 2019
Balasubramanyam S, Shirazi M, Bloodgood MA, Wu L, Verheijen MA, Vandalon V, Kessels WMM, Hofmann JP, Bol AA.   +8 more
europepmc   +1 more source

Controlled Growth of Boron Nitride in Various Phases

Advanced Materials Interfaces, EarlyView.
Phase‐selective boron nitride growth is presented as a unified materials‐design problem across hexagonal, rhombohedral, cubic, and amorphous phases. By linking synthesis routes to thermodynamic stability, kinetic accessibility, surface diffusion, interfacial templating, and energetic activation, this review clarifies how bonding and stacking are ...
Pan Wu, Kanghao Xie, Jiajie Qi, Xiaorui Zheng, Kaihui Liu, Xuedong Bai, Li Wang   +6 more
wiley   +1 more source

On the transformation of "zincone"-like into porous ZnO thin films from sub-saturated plasma enhanced atomic layer deposition. [PDF]

Beilstein J Nanotechnol, 2019
Perrotta A, Pilz J, Pachmajer S, Milella A, Coclite AM.   +4 more
europepmc   +1 more source

Optoelectronic properties of CuO deposited by plasma-enhanced atomic layer deposition

Vacuum
Anne Haggrén, Gabriel Bartholazzi, Lachlan Watson, Daniel Macdonald, Kylie Catchpole, Lachlan Black   +5 more
openaire   +1 more source

Surface Functionalization Modulates Collective Cell Behavior Near Topological Defects Induced by Topographical Patterning

Advanced Materials Interfaces, EarlyView.
Strongly adhered cells align with concentric circular ridges and exhibit predominantly tangential motion, whereas weakly adhered cells fail to follow topographical guidance and display enhanced radial inward motion. ABSTRACT Living cells establish long‐range orientational order through collective alignment, giving rise to topological defects whose ...
Prasoon Awasthi, Aniruddh Murali, Ellen Juel Pørtner, Adam Cohen Simonsen, Francesca Serra   +4 more
wiley   +1 more source

Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition. [PDF]

Materials (Basel), 2019
Seppänen H, Kim I, Etula J, Ubyivovk E, Bouravleuv A, Lipsanen H.   +5 more
europepmc   +1 more source

Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication

Advanced Materials Interfaces, EarlyView.
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley   +1 more source