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Plasma‐Enhanced Atomic Layer Deposition of Palladium on a Polymer Substrate

Chemical Vapor Deposition, 2007
AbstractIn this paper, a method for the plasma‐enhanced (PE) atomic layer deposition (ALD) of palladium on air‐exposed, annealed poly(p‐xylylene) (Parylene‐N, or PPX) is presented. Palladium is successfully deposited on PPX at 80 °C using a remote, inductively coupled, hydrogen/nitrogen plasma with palladium (II) hexafluoroacetylacetonate (PdII(hfac)2)
G. A. Ten Eyck   +5 more
openaire   +1 more source

Plasma Enhanced Atomic Layer Deposition of TaN Thin Films

ECS Meeting Abstracts, 2010
Abstract not Available.
Paul Ma, Jiang Lu
openaire   +1 more source

Plasma Enhanced Atomic Layer Deposited Ru for MIMCAP Applications

ECS Meeting Abstracts, 2011
Abstract not Available.
Johan Swerts   +14 more
openaire   +1 more source

Plasma enhanced atomic layer deposition of copper: A comparison of precursors

Surface and Coatings Technology, 2013
Abstract The growth of Cu films by atomic layer deposition using hydrogen plasma has been investigated. To obtain continuous films at sub 5 nm thicknesses the two dimensional coalescence of Cu nucleation sites formed at the start of the deposition process must be enhanced in preference to three dimensional island growth.
D.J. Hagen   +7 more
openaire   +1 more source

Plasma enhanced atomic layer deposition of Ga

Journal of Materials Chemistry A, 2014
Ranjith K. Ramachandran   +7 more
openaire   +1 more source

Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2020
Taguhi Yeghoyan, , Christophe Vallée
exaly  

SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION

2022
PEARLSTEIN RONALD M   +8 more
openaire   +1 more source

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