Results 101 to 110 of about 5,793,946 (166)

Plasma atomic layer deposition [PDF]

, 2019
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time during an excited species phase, wherein activated reactant is supplied such as from a plasma.

core  

Plasma-Enhanced Atomic Layer Deposition of Hematite for Photoelectrochemical Water Splitting Applications

Crystals
Hematite (α-Fe2O3) is one of the most promising and widely used semiconductors for application in photoelectrochemical (PEC) water splitting, owing to its moderate bandgap in the visible spectrum and earth abundance.
Thom R. Harris-Lee, Andrew Brookes, Jie Zhang, Cameron L. Bentley, Frank Marken, Andrew L. Johnson   +5 more
doaj   +1 more source

Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition

, 2017
There is a great interest in various branches of the advanced materials industry for the development of novel methods (and improvements to existing ones) for the deposition of conformal ultrathin metallic films.
Bosnick, ken, Hogan, James D., Cui, Kai, Motamedi, Pouyan, Cadien, Ken   +4 more
core   +1 more source

Plasma atomic layer deposition [PDF]

, 2018
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time during an excited species phase, wherein activated reactant is supplied such as from a plasma.

core  

Plasma-assisted atomic layer deposition of ultrathin oxide and metal films [PDF]

, 2009
Atomic layer deposition (ALD) is a thin film deposition method based on alternating saturated surface chemical reactions in which the self-limiting growth behavior allows for the deposition of ultrathin films with submonolayer control and with a high ...
Kessels, WMM Erwin, Kessels, W.M.M.
core   +1 more source

Selective Plasma Mode Modulation in HfO₂ Charge Trap Layers via RP/DP/RP Atomic Layer Deposition for Enhanced Memory Performance and Interface Quality. [PDF]

Micromachines (Basel)
Kim B, Jang Y, Nam H, Hong C, Kang M, Lee W, Yoon C.   +6 more
europepmc   +1 more source

Studies on enhanced OLED performance using Al2O3 buffer layer by atomic layer deposition

, 2012
 It has been found that introduction of buffer layers between organic holes transport layer and anode layer plays an important role in improving device stability and hole injection efficiency.
Z. Cui（崔铮）, W. M. Su *（苏文明）, L. Zhou（周璐）   +2 more
core  

Atomic Layer Deposition Processes: Versatile Platforms for Engineering ZnO-Chitosan Biointerfaces. [PDF]

Adv Healthc Mater
Moreno M, Devi A, Zanders D, Arredondo M, Mariotti D, McGlynn R, Devis S, Guerrero S, Benavente E, Alegría M, Olguin Y, Lobos-Gonzalez L, Guzmán K, Rivas-Yañez E, Solar P, Cepus V, Krause M, Velásquez L.   +17 more
europepmc   +1 more source

Editor's Choice Articles in the Electronic Materials Section of <i>Materials</i> in 2025. [PDF]

Materials (Basel)
Roccaforte F.
europepmc   +1 more source

Thermoelectric and electronic transport properties of thermal and plasma-enhanced ALD grown titanium nitride thin films. [PDF]

Nanoscale Adv
Goel P, Kauppinen C, Raju R, Tittonen I.
europepmc   +1 more source