Results 91 to 100 of about 5,793,946 (166)

Ultra-thin aluminium oxide films deposited by plasma-enhanced atomic layer deposition for corrosion protection [PDF]

, 2011
We have employed plasma-enhanced and thermal atomic layer deposition (ALD) within the temperature range of 50–150°C for the deposition of ultra-thin (10–50 nm) Al2O3 films on 100Cr6 steel and aluminium Al2024-T3 alloys.
M. Fenker, B. Díaz, Potts, SE Stephen, Kessels, WMM Erwin, Swiatowska, J., Díaz, B., Tóth, L., Swiatowska, J, Schmalz, L, Radnóczi, G, Maurice, V., W. M. M. Kessels, Maurice, V, Seyeux, A., L. Tóth, S. E. Potts, Díaz, B, A. Seyeux, P. Marcus, Seyeux, A, V. Maurice, L. Schmalz, Tóth, L, Fenker, M, G. Radnóczi, Potts, S.E., Radnóczi, G., Marcus, P., Marcus, P, Fenker, M., Schmalz, L., Kessels, W.M.M., J. Światowska   +32 more
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Plasma enhanced atomic layer deposition of oxides on graphene

, 2016
: Integration of dielectrics with graphene is essential to the fulfillment of graphene based electronic applications. While many dielectric deposition techniques exist, plasma enhanced atomic layer deposition (PEALD) is emerging as a technique to deposit

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Field Emission from Carbon Nanotubes on Titanium Nitride-Coated Planar and 3D-Printed Substrates

Nanomaterials
Carbon nanotubes (CNTs) are well known for their outstanding field emission (FE) performance, facilitated by their unique combination of electrical, mechanical, and thermal properties. However, if the substrate of choice is a poor conductor, the electron
Stefanie Haugg, Luis-Felipe Mochalski, Carina Hedrich, Isabel González Díaz-Palacio, Kristian Deneke, Robert Zierold, Robert H. Blick   +6 more
doaj   +1 more source

Plasma atomic layer deposition [PDF]

, 2020
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time during an excited species phase, wherein activated reactant is supplied such as from a plasma.

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Ti-metalation of chitosan films by VPM, MPI and PEALD processes: An avenue to antiseptic scaffolds and functional biopolymers

Applied Surface Science Advances
This study investigates the impact of different Atomic Layer Deposition techniques on the Ti-metalation of chitosan (CS) for biomedical applications. Three methods – vapour phase metalation (VPM), multiplied pulsed vapour phase infiltration (MPI), and O₂
Mabel Moreno, Anjana Devi, David Zanders, Miryam Arredondo, Davide Mariotti, Ruairi McGlynn, Paula Solar, Sindy Devis, Carolina Klagges, Simón Guerrero, Eglantina Benavente, Matias Alegría, Hugo Sanchéz-Ruderisch, Yusser Olguin, Elizabeth Rivas-Yañez, Valentin Cepus, Michael Krause, Luis Velazquez   +17 more
doaj   +1 more source

Innovative stress-release method for low-stress flexible Al2O3 encapsulation films in OLED applications

npj Flexible Electronics
This study presents a low residual tensile stress, flexible thin film encapsulation with a 2 mm bending radius based on atomic layer deposition (ALD), specifically plasma-enhanced ALD (PEALD).
Guanran Wang, Zhenyu Wang, Jianyang Ren, Zhijun Wu, Yu Duan   +4 more
doaj   +1 more source

Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films and Heterostructures: Mechanisms and Applications

Crystals
Group III-nitride semiconductors (GaN, AlN, InN) serve as foundational materials for modern optoelectronics, high-frequency microelectronics, and next-generation energy harvesting devices.
Sanjie Liu, Zilong Zeng, Yongyong Cao, Zhenyi Deng, Xinjie Li, Zixin Liang, Rongjie Feng, Jiaping Long, Yu Liu, Ruifan Tang, Xinhe Zheng   +10 more
doaj   +1 more source

Opportunities for plasma-assisted atomic layer deposition

, 2007
Within the method of atomic layer deposition (ALD), additional reactivity can be delivered to the surface in the form of plasmaproduced species. The application of such a low-temperature plasma in the ALD cycle can therefore open up a processing ...
Heil, S.B.S., Hemmen, van, J.L., Langereis, E., Knoops, H.C.M.; id_orcid, Sanden, van de, M.C.M., Knoops, H.C.M., Kessels, W.M.M., Keuning, W.   +7 more
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Carbon‐Doped Amorphous Gallium Oxide Forms a Heterojunction With Water to Improve the Electrocatalytic Oxygen Evolution Reaction

Carbon Energy
The weak interactions between powdered catalysts and their supports significantly impact the kinetics of the water electrolysis oxidation reaction. Here, we use plasma‐enhanced atomic layer deposition (PEALD) technology to directly construct amorphous ...
Ruijie Dai, Yuwan Xiang, Jueyu Chen, Guoyong Fang, Xi'an Chen, Daying Guo, Bin Xi   +6 more
doaj   +1 more source

Selective deposition of Ta₂O₅ by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps

, 2017
International audienceIn this paper, a new route for a selective deposition of thin oxide by atomic layer deposition is discussed. The proposed process is using super cycles made of an additional plasma etching step in a standard plasma enhanced atomic ...
Vallat, Rémi, Rémy Gassilloud, Vallée, Christophe, Rémi Vallat, Christophe Vallée, Eychenne, Brice, Brice Eychenne, Gassilloud, Rémy   +7 more
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