Results 141 to 150 of about 5,793,946 (166)

The Role of Surface Topography in Bacterial Adhesion to Amorphous TiO₂-Coated PMMA. [PDF]

Dent J (Basel)
Zeneral Žuža I, Car Kubaska I, Bojanić K, Jelovica Badovinac I, Kovač Z, Perčić M, Peter R, Šarić Janković I, Kolympadi Marković M, Kraljević Pavelić S, Marković D.   +10 more
europepmc   +1 more source

Integration and electrical evaluation of WS₂ and MoS₂ fets in a 300 mm pilot line. [PDF]

Discov Electron
Schram T, Smets Q, Opdebeeck A, Ghosh S, Groven B, Kumar P, Medina HM, Cott D, deMarneffe JF, Dongre H, Kruv A, Panarella L, Pinotti LF, Morin P, Kar GS, Lockhart de la Rosa CJ.   +15 more
europepmc   +1 more source

High-density three-dimensional integration of dynamic random-access memory using vertical dual-gate IGZO TFTs. [PDF]

Nat Commun
Liao F, Zhu Z, Li Z, Yang G, Liu M, Chen K, Lu W, Wu Z, Zhang X, Mao N, Kang BM, Shi J, Wu XS, Jin M, Liu C, Zhang J, Yu Y, Wang GL, Lu C, Yue J, Wang L, Wang J, Geng D, Lu N, Zhao C, Nathan A, Li L, Liu M.   +27 more
europepmc   +1 more source

Capped Vapor-Liquid-Solid Growth of Vanadium-Substituted Molybdenum Disulfide Ultrathin Films for Enhanced Photocatalytic Activity. [PDF]

ACS Nano
Huang PP, Qorbani M, Hung YT, Lai YR, Sabbah A, Tseng MF, Huang CY, Koodathil S, Kholimatussadiah S, Hussien MK, Feng TH, Liu YH, Wang H, Lin JW, Wang CH, Wu CI, Hayashi M, Chen KH, Chen LC.   +18 more
europepmc   +1 more source

Atomic armor for thermal stability in nanoporous structures. [PDF]

Proc Natl Acad Sci U S A
Yang R, Si Q, Sheng Q, Yang M, Du M, Zhang H, Shi XL, Tang G, Chen ZG.   +8 more
europepmc   +1 more source

Growth of Zn-N Co-Doped Ga₂O₃ Films by a New Scheme with Enhanced Optical Properties. [PDF]

Nanomaterials (Basel)
Liao D, Zhang Y, Wang R, Yan T, Li C, Tian H, Wang H, Ye ZG, Ren W, Niu G.   +9 more
europepmc   +1 more source

Model for Predicting Film Thickness Depending on the Values of the Atomic Layer Deposition Process Parameters. [PDF]

ACS Omega
Polomskikh V, Petkieva D, Dudin A, Rudakov G.   +3 more
europepmc   +1 more source

Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration

Surface and Coatings Technology, 2017
Room-temperature plasma-enhanced atomic layer deposition (PEALD) of ZnO was studied by depositing the films using diethylzinc and O2 plasma from inductively-coupled plasma (ICP) and capacitively-coupled plasma (CCP) plasma source configurations.
Manu Lahtinen, Timo Sajavaara, Mari Napari   +2 more
exaly   +2 more sources

Improved dielectric properties of BeO thin films grown by plasma enhanced atomic layer deposition [PDF]

Solid-State Electronics, 2020
Beryllium oxide (BeO) thin films were grown on a p-type Si substrate by plasma enhanced atomic layer deposition (PEALD) using diethylberyllium as a precursor and O2 plasma. The PEALD BeO exhibited self-saturation and linear growth rates.
Seung Min Lee, Christopher Bielawski, Jungwoo Oh   +2 more
exaly   +2 more sources

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Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films

Wear, 2023
Tomas Grejtak, Kylie Van Meter, Md Istiaque Chowdhury   +2 more
exaly