Results 51 to 60 of about 24,132 (263)

Combined D-optimal design and generalized regression neural network for modeling of plasma etching rate

open access: yesInternational Journal of Metrology and Quality Engineering, 2014
Plasma etching process plays a critical role in semiconductor manufacturing. Because physical and chemical mechanisms involved in plasma etching are extremely complicated, models supporting process control are difficult to construct ...
You Hailong   +3 more
doaj   +1 more source

Rapid Microwave Plasma Engineering of HfO2/C@C Core‐Shell Fibrous Membrane Toward Flexible High‐Performance Electromagnetic Wave Absorption

open access: yesAdvanced Functional Materials, EarlyView.
Rapid microwave plasma torch engineering tunes crystal phases, carbon graphitization and oxygen‐vacancy defects in HfO2/C@C core‐shell fibrous membranes. Synergistic multi‐loss effects optimize impedance matching to deliver −65.75 dB reflection loss and a 7.37 GHz effective bandwidth for flexible electromagnetic wave absorption.
Qichao Ding   +14 more
wiley   +1 more source

An Adaptive Inhibitory WSe2 Transistor for Retinomorphic In‐Sensor Image Processing

open access: yesAdvanced Functional Materials, EarlyView.
Conventional retinomorphic devices typically require deliberate gate‐bias tuning for each illumination condition. In this paper, we demonstrate an adaptive inhibitory WSe2 transistor that uses photo‐induced regime shift between the subthreshold and accumulation modes to achieve decision‐free, intensity‐adaptive image processing within a single pixel ...
Juhwan Baek   +12 more
wiley   +1 more source

Recent Progress of Black Silicon: From Fabrications to Applications

open access: yesNanomaterials, 2020
Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on.
Zheng Fan   +9 more
doaj   +1 more source

Nitride MXenes Beyond Carbides: Bridging the Gap Between Computational Prediction and Experimental Realization

open access: yesAdvanced Functional Materials, EarlyView.
Nitride MXenes remain constrained by a persistent gap between computational prediction and experimental realization. This Review identifies the thermodynamic, kinetic, and chemical barriers limiting their synthesis, critically evaluates emerging fabrication routes, and proposes a multidimensional computational‐experimental framework to accelerate the ...
Naresh Varnakavi, Masoud Soroush
wiley   +1 more source

Structure‐Property Relationships in Catecholamine Coatings for Broad Surface Functionalization

open access: yesAdvanced Functional Materials, EarlyView.
Inspired by mussel adhesive proteins (MAPs), six catecholamine molecules with different molecular structure were systematically characterized and compared based on their ability to form homogeneous, reactive coatings. Highlighting candidates capable of balancing coating properties of interest, their successful use as primer layers for organic and ...
Caroline F. Harms   +5 more
wiley   +1 more source

Out‐of‐Plane Strain‐Decoupled Architecture for High‐Fill‐Factor Stretchable OLED Displays

open access: yesAdvanced Functional Materials, EarlyView.
A vertically decoupled multilayer SOLED architecture separates emissive pixel islands from deformable interconnects, allowing low‐modulus elastomeric layers to accommodate applied strain and suppress strain transfer to the OLED region. This design, combined with transparent hybrid encapsulation, enables a high fill factor (∼75%), stretchability ...
Young Hyun Son   +2 more
wiley   +1 more source

Defect‐Mediated Inelastic Light Scattering by Infrared Phonons in Hexagonal Boron Nitride

open access: yesAdvanced Functional Materials, EarlyView.
Optically active defects in hexagonal boron nitride enable inelastic stimulated light scattering mediated by infrared‐active phonons, relaxing conventional Raman selection rules. Defect engineering enhances the Stokes‐conversion process and activates both TO‐ and LO‐phonon scattering channels.
Prabhdeep Singh   +4 more
wiley   +1 more source

The influence of the chemical and physical component of the plasma etching of the surface of gallium arsenide on the etching rate in the chloride plasma of the combined discharge

open access: yesJournal of Physics: Conference Series, 2017
In this paper, experimental studies were carried out on the formation of a microrelief on the surface of gallium arsenide substrates. The surface was modified by the method of plasma etching. Etching was carried out in a medium of chloride gas. In the work, the etching rates of the surface of gallium arsenide depend on the power of the inductively ...
V S Klimin   +4 more
openaire   +1 more source

Self‐Powered, Ultra‐Sensitive InGaAs/ITO Nanowire Radial Junction Infrared Photodiode for Low Flux Imaging at Room Temperature

open access: yesAdvanced Functional Materials, EarlyView.
This study reports a self‐powered InGaAs nanowire photodetector achieving single‐photon‐level sensitivity in the shortwave infrared at non‐cryogenic temperatures. The device demonstrates high‐speed imaging capabilities even under extremely low‐flux conditions.
Kosala Dhanawansha   +10 more
wiley   +1 more source

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