Results 1 to 10 of about 14,043 (162)

Wet Chemical and Plasma Etching of Photosensitive Glass

Solids, 2023
Photosensitive glasses for radiation-induced 3D microstructuring, due to their optical transparency and thermal, mechanical, and chemical resistance, enable the use of new strategies for numerous microscale applications, ranging from optics to biomedical
Ulrike Brokmann, Christoph Weigel, Luisa-Marie Altendorf, Steffen Strehle, Edda Rädlein   +4 more
doaj   +4 more sources

Surface Modification of Additively Manufactured Nitinol by Wet Chemical Etching. [PDF]

Materials (Basel), 2021
Three-dimensional printed nitinol (NiTi) alloys have broad prospects for application in medicine due to their unique mechanical properties (shape memory effect and superplasticity) and the possibilities of additive technologies. However, in addition to mechanical properties, specific physicochemical characteristics of the surface are necessary for ...
Nazarov D, Nazarov D, Rudakova A, Borisov E, Popovich A.   +4 more
europepmc   +4 more sources

Mechanistic insights into the acidic wet-chemical silicon etching in HF–HX–X2 solutions, X = Cl, Br, I [PDF]

RSC Advances
Alkaline, wet-chemical silicon etching is an essential part in the manufacturing of silicon solar cells, because the anisotropy of the etching process enables texturization of the wafer surface.
Nils Schubert, Niklas Zomack, André Stapf, Edwin Kroke   +3 more
doaj   +2 more sources

Combined metal-assisted chemical etching and anisotropic wet etching for anti-reflection inverted pyramidal cavities on dendrite-like textured substrates

Results in Physics, 2019
A simple and low-cost method using the combination of metal-assisted chemical etching (MacEtch) and anisotropic wet etching was performed to fabricate anti-reflection inverted pyramidal cavities on dendrite-like textured silicon substrates.
Yu-Keng Lin, Yen-Shin Chen, Chun-Hway Hsueh   +2 more
doaj   +3 more sources

Microgravity-induced wet chemical etching of borosilicate glass enhances the process rate [PDF]

Scientific Reports
In the paper, microgravity simulators—Random Positioning Machine (RPM) and Rotary Wall Vessel (RWV) – were used to investigate the potential influence of quasi zero-gravity force onto the wet chemical etching of borosilicate glass substrates.
Agnieszka Krakos, Kamil Baranowski, Marcin Białas   +2 more
doaj   +2 more sources

Advanced Etching Techniques of LiNbO₃ Nanodevices

Nanomaterials, 2023
Single LiNbO3 (LNO) crystals are widely utilized in surface acoustic wave devices, optoelectronic devices, and novel ferroelectric memory devices due to their remarkable electro-optic and piezoelectric properties, and high saturation and remnant ...
Bowen Shen, Di Hu, Cuihua Dai, Xiaoyang Yu, Xiaojun Tan, Jie Sun, Jun Jiang, Anquan Jiang   +7 more
doaj   +1 more source

Using Anisotropic Silicon Etch for Change the Crystal Orientation of Silicon Wafer [PDF]

Engineering and Technology Journal, 2012
In this work، anisotropic silicon etch using KOH ، optical microscopic and X-ray diffraction testing، were used to determine the crystal orientation of the silicon wafer(100) plane , where the mechanical polishing and wet etching described the geometric ...
Saria D.mohammed, Arrej Rlyadh Saeed, Atheer Ibraheem Bbd   +2 more
doaj   +1 more source

Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions

Micro and Nano Engineering, 2023
Ruthenium (Ru) is a noble metal and is known to be resistant to many common chemicals and mixtures. We report in this study a controlled etching/recessing of Ru via wet processing and a combination of dry and wet process using metal-free chemical ...
Q.T. Le, E. Gül Arslan, J. Rip, H. De Coster, P. Verdonck, D. Radisic, F. Schleicher, I. Vaesen, T. Conard, E. Altamirano-Sanchez   +9 more
doaj   +1 more source

Fabrication of wafer-scale nanoporous AlGaN-based deep ultraviolet distributed Bragg reflectors via one-step selective wet etching

Scientific Reports, 2022
In this paper, we reported on wafer-scale nanoporous (NP) AlGaN-based deep ultraviolet (DUV) distributed Bragg reflectors (DBRs) with 95% reflectivity at 280 nm, using epitaxial periodically stacked n-Al0.62Ga0.38N/u-Al0.62Ga0.38N structures grown on AlN/
Yongming Zhao, Maocheng Shan, Zhihua Zheng, Pengcheng Jian, WeiJie Liu, Shizhou Tan, Changqing Chen, Feng Wu, Jiangnan Dai   +8 more
doaj   +1 more source

Wet chemical etching survey of III-nitrides [PDF]

Solid-State Electronics, 1997
AbstractWet chemical etching of GaN, InN, AIN, InAlN and InGaN was investigated in various acid and base solutions at temperatures up to 75°C. Only KOH-based solutions were found to etch AIN and InAlN. No etchants were found for the other nitrides, emphasizing their extreme lack of chemical reactivity.
Department of Materials Science and Engineering, University of Florida Gainesville FL 32611, U.S.A. ( host institution ), Vartuli, C.B. ( author ), Pearton, S.J. ( author ), Abernathy, C.R. ( author ), MacKenzie, J.D. ( author ), Ren, F. ( author ), Zolper, J.C. ( author ), Shul, R.J. ( author )   +7 more
openaire   +2 more sources