Results 41 to 50 of about 5,716,928 (282)
Despite benefits to storage stability and handleability of aluminum scrap, octadecyl phosphonic acid (ODPA) SAMs reduce the tensile strength of wires produced using friction‐induced recycling. Etching and methyl diphosphonic acid (MDPA) coatings, however, have little effect.
Timothy D. Goller +3 more
wiley +1 more source
Tapered Optical Fiber Couplers Fabricated by Droplet-Based Chemical Etching
This paper presents a fabrication method for 2 × 2 twisted fiber-optic directional couplers based on biconical low-loss tapered optical fibers using a two-step wet-etching technique with hydrofluoric acid-based droplets and surface tension-driven ...
Gyeongho Son, Youngho Jung, Kyoungsik Yu
doaj +1 more source
Shellac, a centuries‐old natural resin, is reimagined as a green material for flexible electronics. When combined with silver nanowires, shellac films deliver transparency, conductivity, and stability against humidity. These results position shellac as a sustainable alternative to synthetic polymers for transparent conductors in next‐generation ...
Rahaf Nafez Hussein +4 more
wiley +1 more source
In MOCVD MoS2 memristors, a current compliance‐regulated Ag filament mechanism is revealed. The filament ruptures spontaneously during volatile switching, while subsequent growth proceeds vertically through the MoS2 layers and then laterally along the van der Waals gaps during nonvolatile switching.
Yuan Fa +19 more
wiley +1 more source
Integration of Low‐Voltage Nanoscale MoS2 Memristors on CMOS Microchips
This article presents the first monolithic integration of nanoscale MoS2‐based memristors into the back‐end‐of‐line of foundry‐fabricated CMOS microchips in a one‐transistor‐one‐resistor (1T1R) architecture. The MoS2‐based 1T1R cells exhibit forming‐free, nonvolatile resistive switching with ultra‐low operating voltages, low cycle‐to‐cycle variability ...
Jimin Lee +16 more
wiley +1 more source
Dry etching and sputtering [PDF]
Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and ...
Wilkinson, C.D.W. +3 more
core +2 more sources
H3PO4-based wet chemical etching for recovery of dry-etched GaN surfaces
The impact of several wet etchants commonly encountered in the microelectronic industry on the surface chemistry of GaN on silicon was explored. In order to get closer to fully recessed gate HEMT fabrication processes, we investigated different kinds of GaN surfaces.
Benrabah, Sabria +8 more
openaire +3 more sources
ABSTRACT Chitosan, a polysaccharide upcycled from biowaste, has long promised sustainable, biocompatible, and antimicrobial films and devices, an appeal reinforced by its recent regulatory recognition, with several chitosan‐based antibacterial dressings gaining clearance through the Food and Drug Administration's 510(k) pathway.
Jacopo Nicoletti +16 more
wiley +1 more source
Wet Chemical Etching Of Ligao2 And Lialo2
The effects of temperature and wet chemical etching solution on the etch rate LiGaO2 and LiAlO2 were investigated. The solutions studied were H2SO4, H3PO4, and HCl.
Johnson, J. W., Ip, K. P., Hsu, C. H.
core +2 more sources
This study sought to fabricate a three-dimensional structure on a silicon surface using a combination of tribo-nanolithography (TNL) and wet chemical etching.
Noritaka KAWASEGI +5 more
doaj +1 more source

