Results 11 to 20 of about 4,565 (255)

A fluid model of pulsed direct current planar magnetron discharge

Scientific Reports, 2023
We simulated a pulsed direct current (DC) planar magnetron discharge using fluid model, solving for species continuity, momentum, and energy transfer equations, coupled with Poisson equation and Lorentz force for electromagnetism. Based on a validated DC
Si Bui Quang Tran, Fong Yew Leong, Ramanarayan Hariharaputran, Duc Vinh Le   +3 more
doaj   +1 more source

The Effect of Plasma Activation of Reactive Gas in Reactive Magnetron Sputtering

East European Journal of Physics, 2023
The effect of plasma activation of reactive gas on the process of reactive magnetron synthesis of oxide coatings was theoretically and experimentally investigated using a radio-frequency inductively coupled plasma source, which creates a flow of ...
Stanislav V. Dudin, Stanislav D. Yakovin, Aleksandr V. Zykov   +2 more
doaj   +1 more source

Moderate temperature deposition of RF magnetron sputtered SnO2-based electron transporting layer for triple cation perovskite solar cells

Scientific Reports, 2023
The perovskite solar cells (PSCs) are still facing the two main challenges of stability and scalability to meet the requirements for their potential commercialization.
Y. Zakaria, B. Aïssa, T. Fix, S. Ahzi, S. Mansour, A. Slaoui   +5 more
doaj   +1 more source

Electrophysical properties of vanadium oxide films deposited by reactive magnetron sputtering

Доклады Белорусского государственного университета информатики и радиоэлектроники, 2020
The aim of this work was to study the effect of the gas composition during sputtering on the electrophysical properties of vanadium oxide films deposited by pulsed reactive magnetron sputtering of a vanadium target in an Ar/O2 medium of working gases.The
T. D. Nguen, A. I. Zanko, D. A. Golosov, S. M. Zavadski, S. N. Melnikov, V. V. Kolos   +5 more
doaj   +1 more source

Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO2 thin films

Results in Physics, 2017
Titanium dioxide (TiO2) films with thicknesses around 300 nm were deposited on glass substrates by reactive radio frequency (RF) magnetron sputtering at constant RF sputtering power (200 W), high sputtering pressure and room temperature.
A.R. Grayeli Korpi, Sahare Rezaee, C. Luna, Ş. Ţălu, A. Arman, A. Ahmadpourian   +5 more
doaj   +1 more source

Fabrication of atomically abrupt interfaces of single-phase TiH2 and Al2O3

APL Materials, 2017
We report the fabrication of atomically abrupt interfaces of titanium dihydride (δ-TiH2) films and α-Al2O3(001) substrates. With the assistance from reactive hydrogen in plasma, single-phase δ-TiH2 epitaxial thin films were grown on α-Al2O3(001 ...
Ryota Shimizu, Yuki Sasahara, Hiroyuki Oguchi, Kuniko Yamamoto, Issei Sugiyama, Susumu Shiraki, Shin-ichi Orimo, Taro Hitosugi   +7 more
doaj   +1 more source

Structural and Morphological Characteristics of Inxga1-xN Films Grown on SI (111) by Reactive Magnetron Sputtering

MATEC Web of Conferences, 2016
Under various power ratios and temperatures, Inxga1-xN films with different indium composition x were grown on Si(111) substrates by reactive magnetron sputtering, and then annealed at ammonia atmosphere around 700°C for 2 hours. The indium composition x
Wang Xuewen, He Lin, Li Xiaoqing, Su Xingxing, Zhang Zhiyong, Zhao Wu   +5 more
doaj   +1 more source

Data on nitridation effect of AlTiTaZrHf(-N) high entropy films by X-ray photoelectron spectroscopy

Data in Brief, 2022
The data presented in this article are related to the published research of “Effect of nitrogen content on structural and mechanical properties of AlTiZrTaHf(-N) high entropy films deposited by reactive magnetron sputtering”. This database contains X-ray
Mohamed El Garah, Djallel Eddine Touaibia, Sofiane Achache, Alexandre Michau, Elizaveta Sviridova, Pavel S. Postnikov, Mohamed M. Chehimi, Frederic Schuster, Frederic Sanchette   +8 more
doaj   +1 more source

Deposition of 3YSZ-TiC PVD Coatings with High-Power Impulse Magnetron Sputtering (HiPIMS)

Applied Sciences, 2021
Optimized coating adhesion and strength are the advantages of high-power impulse magnetron sputtering (HiPIMS) as an innovative physical vapor deposition (PVD) process.
Bastian Gaedike, Svenja Guth, Frank Kern, Andreas Killinger, Rainer Gadow   +4 more
doaj   +1 more source

Magnetron sputtered iridium oxide as anode catalyst for PEM hydrogen generation

Macedonian Journal of Chemistry and Chemical Engineering, 2011
Thin films of iridium oxide are deposited by reactive magnetron sputtering. The influence of oxygen partial pressure in the sputtering plasma on the composition, surface structure and morphology of the films has been studied by XRD, SEM, AFM and XPS ...
Evelina P. Slavcheva
doaj   +1 more source