Results 21 to 30 of about 4,565 (255)

Review of GaN Thin Film and Nanorod Growth Using Magnetron Sputter Epitaxy

Applied Sciences, 2020
Magnetron sputter epitaxy (MSE) offers several advantages compared to alternative GaN epitaxy growth methods, including mature sputtering technology, the possibility for very large area deposition, and low-temperature growth of high-quality electronic ...
Aditya Prabaswara, Jens Birch, Muhammad Junaid, Elena Alexandra Serban, Lars Hultman, Ching-Lien Hsiao   +5 more
doaj   +1 more source

Porous Mo2N nano-column array thin film electrode for lithium ion storage

Results in Physics, 2019
A face-centered cubic Mo2N film is successfully prepared on Cu foil by reactive DC magnetron sputtering. The thickness of Mo2N film is about 1.5 μm with porous and nano-column array.
Lixia Wang, Lei Li, Xiaoying Guo, Jinqiao Zhang, Pandeng Liu, Ji Yan   +5 more
doaj   +1 more source

Plasma Systems in Thin Film Technology

Доклады Белорусского государственного университета информатики и радиоэлектроники
The article discusses the current trends in the development of ion-plasma systems for ion processing and thin film deposition. Application of pulsed reactive magnetron sputtering for deposition of vanadium oxide films and dependence of process parameters
A. P. Dostanko, S. I. Madveyko, E. V. Telesh, S. N. Melnikov, S. M. Zavadski, D. A. Golosov   +5 more
doaj   +1 more source

GAS FLOW CONTROL SYSTEM IN REACTIVE MAGNETRON SPUTTERING TECHNOLOGY

Приборы и методы измерений, 2015
It is known that the discharge parameters and the chemical composition of the particles flux impinging onto the substrate during a reactive magnetron sputtering are unstable.
I. M. Klimovich, V. N. Kuleshov, V. A. Zaikou, A. P. Burmakou, F. F. Komarov, O. R. Ludchik   +5 more
doaj   +1 more source

Unprecedented high-temperature electrical insulation of reactively sputtered AlN thin films

Materials & Design
This study investigates the morphological and electrical properties of hexagonal aluminium nitride (h-AlN) films synthesized through different reactive sputtering techniques at low growth temperatures (270 °C) – specifically direct and pulsed current ...
N. Salvadores Farran, T.M. Huber, T. Wojcik, A. Gies, J. Ramm, S. Kolozsvári, P. Polcik, M. Stöger-Pollach, J. Rath, J. Fleig, H. Riedl   +10 more
doaj   +1 more source

Structural Formation and Photocatalytic Activity of Magnetron Sputtered Titania and Doped-Titania Coatings

Molecules, 2014
Titania and doped-titania coatings can be deposited by a wide range of techniques; this paper will concentrate on magnetron sputtering techniques, including “conventional” reactive co-sputtering from multiple metal targets and the recently introduced ...
Peter J. Kelly, Glen T. West, Marina Ratova, Leanne Fisher, Soheyla Ostovarpour, Joanna Verran   +5 more
doaj   +1 more source

Tailoring Functional Properties of Ti–Ni–Cu Shape Memory Alloy Thin Films for MEMS Actuators

Advanced Engineering Materials, EarlyView.
A comprehensive study of critical parameters required to develop well‐performing Ti–Ni–Cu thin film shape memory alloy microactuators is provided. Materials science and device integration aspects are integrated by addressing structural and physical relationships using complementary characterization techniques as well as a practical fabrication solution
Elaheh Akbarnejad, Aleksander Kostka, Gowtham Arivanandhan, Yujiao Li, Alan Savan, Manfred Kohl, Alfred Ludwig   +6 more
wiley   +1 more source

Resistive switching behaviors of oxygen-rich TaOx films prepared by reactive magnetron sputtering

Journal of Asian Ceramic Societies, 2023
In this work, Ta2O5 films were first deposited on Si substrates by reactive magnetron sputtering of a Ta metal target at various substrate temperatures, RF powers and sputtering pressures.
Ziheng Ding, Jia Tang, Fangren Hu, Wei Zhang   +3 more
doaj   +1 more source

Self‐Sintering Ionogel Binder for Flexible, Recyclable, and Healable Printed Giant Magnetoresistive Sensors

Advanced Functional Materials, EarlyView.
ABSTRACT Electronic waste has emerged as a major environmental challenge, driven by the massive consumption and a limited lifetime of modern electronic devices, stimulating the development of sustainable electronics. Here, an all‐biomaterial gelatin‐choline‐citric acid ([Ch][CA]) ionogel is developed as an active binder to realize self‐sintered ...
Lin Guo, Xiaotao Wang, Guannan Mu, Proloy Taran Das, Igor Veremchuk, Conrad Schubert, Aaron D. Cross, Yevhen Zabila, Xuan Peng, Larysa Baraban, Denys Makarov   +10 more
wiley   +1 more source

Reactive sputtering of δ-ZrH2 thin films by high power impulse magnetron sputtering and direct current magnetron sputtering

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2014
Reactive sputtering by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) of a Zr target in Ar/H2 plasmas was employed to deposit Zr-H films on Si(100) substrates, and with H content up to 61 at. % and O contents typically below 0.2 at. % as determined by elastic recoil detection analysis.
Högberg, Hans, Tengdelius, Lina, Samuelsson, Mattias, Eriksson, Fredrik, Broitman, Esteban, Lu, Jun, Jensen, Jens, Hultman, Lars   +7 more
openaire   +3 more sources