Results 11 to 20 of about 11,389 (196)
A new analytical model to analyze and optimize the electrical characteristics of 4H-SiC trench-gate metal-oxide-semiconductor field-effect transistors (TMOSFETs) with a grounded bottom protection p-well (BPW) was proposed.
Jee-Hun Jeong, Ogyun Seok, Ho-Jun Lee
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Comparative Characterization of NWFET and FinFET Transistor Structures Using TCAD Modeling
A complete comparison for 14 nm FinFET and NWFET with stacked nanowires was carried out. The electrical and thermal performances in two device structures were analyzed based on TCAD simulation results.
Konstantin O. Petrosyants +2 more
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Nano-Electronic Simulation Software (NESS): A Novel Open-Source TCAD Simulation Environment
This paper presents the latest status of the open source advanced TCAD simulator called Nano-Electronic Simulation Software (NESS) which is currently under development at the Device Modeling Group of the University of Glasgow.
Cristina Medina-Bailon +6 more
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Device to Circuit Co-Design Utilizing High-Performance PEALD Indium-Gallium-Zinc Oxide Thin-Film Transistor Enabling Technology Node Scaling in Monolithic 3D Systems. [PDF]
This article presents a holistic investigation of M3D‐compatible oxide semiconductor technology using PEALD‐fabricated IGZO TFTs, spanning device‐level characterization, TCAD Modeling, circuit design, and scaled‐node projections. It demonstrates high field‐effect mobility (up to 116.35 cm2 V−1·s−1), robust reliability (△VTH < 0.15 V), low variation ...
Wang W +11 more
europepmc +2 more sources
Powernet: SOI Lateral Power Device Breakdown Prediction With Deep Neural Networks
The breakdown performance is a critical metric for power device design. This paper explores the feasibility of efficiently predicting the breakdown performance of silicon on insulator (SOI) lateral power device using multi-layer neural networks as an ...
Jing Chen +6 more
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Due to its high thermal conductivity, high critical breakdown electric field, and high power, the silicon carbide (SiC) metal-oxide-semiconductor field-effect transistor (MOSFET) has been generally used in industry.
Xinfeng Nie +5 more
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Ferroelectric behavior and NCFETs - TCAD Simulation
With the miniaturization of transistors, the current leakage also increases due to the increasing tunnelling effect. Plus, Boltzmann’s tyranny limits the subthreshold swing to be best and ideal at 60 mV/decade. Due to these, the power consumption in transistors keeps soaring up. Therefore, in this paper, the Negative Capacitance Effect Field Transistor
Naimah Darmis +2 more
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This paper investigates, using Synopsys Sentaurus TCAD simulation, the dependence of the breakdown voltage of n-on-p backside-illumination Silicon Photomultipliers (BSI-SiPM) on the implantation dose, the implantation energy and the screening SiO2 ...
Ran He +7 more
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This work, for the first time, experimentally demonstrates a TCAD-Machine Learning (TCAD-ML) framework to assist the analysis of device-to-device variation and operating (ambient) temperature without the need of physical quantities extraction.
Hiu Yung Wong +8 more
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TCAD Simulation of Single Event Transient in Si Bulk MOSFET at Cryogenic Temperature
In this paper, the functional relationship between temperature and single event transient currents caused by heavy-ion striking using TCAD simulation is investigated from 77K to 300 K on 65nm Si bulk n MOSFET. TCAD simulation shows that temperature has a
Tongshan Lu, Chenghua Wang
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