Results 41 to 50 of about 2,850,351 (204)
Off-State Performance Characterization of an AlGaN/GaN Device via Artificial Neural Networks
Due to the complexity of the 2D coupling effects in AlGaN/GaN HEMTs, the characterization of a device’s off-state performance remains the main obstacle to exploring the device’s breakdown characteristics. To predict the off-state performance of AlGaN/GaN
Jing Chen +7 more
doaj +1 more source
TCAD device modelling and simulation of wide bandgap power semiconductors [PDF]
Technology Computer Aided Design (TCAD) is essential for devices technology development, including wide bandgap power semiconductors. However. most TCAD tools were originally developed for silicon and their performance and accuracy for wide band gap ...
Samuel Perkins +8 more
core +1 more source
A Novel 3D TCAD Simulation of a Thermoelectric Couple configured for Thermoelectric Power Generation [PDF]
This paper documents the novel design, modelling and 3D simulation of a single thermoelectric couple using the Technology Computer Aided Design (TCAD)semiconductor simulation software package by Synopsys.Preliminary simulation results are presented for ...
GRAINGER, Stephen +3 more
core +6 more sources
The dual‐gate coplanar a‐IGZO/C‐IGO/a‐IGZO TFT is investigated, exhibiting a high filed‐effect mobility of 53.81 cm2 V−1s−1 with excellent stability. The amorphous IGZO layer provides smooth surface, which carrier scattering and high‐quality interface between gate insulator and active layer.
Solbee Lee +4 more
wiley +1 more source
HfO2‐based ferroelectrics exhibit wake‐up and fatigue behaviors during electrical cycling, significantly affecting device endurance and reliability. These phenomena are governed by defect dynamics, including oxygen vacancy redistribution and charge trapping.
Hongseok Kim +6 more
wiley +1 more source
Performance Evaluation of MISISFET- TCAD Simulation
A novel device n-MISISFET with a "dielectric stack" instead of the single insulator of n-MOSFET has been described and its characteristics has been obtained in this paper. The desired variation of threshold voltage is obtained with biasing for the novel n-MISISFET for various substrate doping concentrations, the effect temperature variation on various ...
Rajeevan Chandel +2 more
openaire +1 more source
This study examines the effect of the spatial position of locally trapped oxide charge on the gate-to-source and gate-to-drain capacitances of an SOI FinFET using three-dimensional TCAD Sentaurus simulations.
Mirzabaxhrom Foziljonov +4 more
doaj +1 more source
Engineering Slow‐Carrier Interfacial Recombination Enables Tailored Spectral Response
This work demonstrates that weak‐drift slow carriers are preferentially captured at generic semiconductor surfaces/interfaces and recombine. This process is manipulated to achieve tailored spectral response. A tens of µm‐wide depletion region is created to observe surface collection rates for photocarriers generated at different positions.
Yibo Zhang +5 more
wiley +1 more source
The single-event susceptibility of three silicon carbide (SiC) metal-oxide-semiconductor field-effect transistor (MOSFET) power devices structures (planar, trench and double trench) is researched by the technology computer-aided design (TCAD) simulation.
HU Libin1, 2, FENG Shaohui3, SUI Chenglong3, WANG Chengjie3, CHEN Miao3, LU Peng1, YANG Can1, SHU Lei1, , LU Jiang4, LI Bo1, 2
doaj +1 more source
This work electrically characterizes sixteen logic gates built from three‐independent‐gate reconfigurable transistors fabricated on full‐scale 300 mm wafers using the industrial 22 nm fully depleted FDSOI process of GlobalFoundries. Static and time‐resolved measurements confirm correct operation, including a 1‐bit adder and reconfigurable AOI/OAI ...
Juan P. Martinez +12 more
wiley +1 more source

