Results 51 to 60 of about 1,965 (222)

A New On-Chip ESD Strategy Using TFETs-TCAD Based Device and Network Simulations

open access: yesIEEE Journal of the Electron Devices Society, 2018
For the first time, this paper reports the quasi-static behavior and the applicability of the tunnel field effect transistor (TFET) for the on-chip electrostatic discharge (ESD) protection. ESD evaluations are performed on 28-nm fully depleted silicon-on-
Radhakrishnan Sithanandam   +1 more
doaj   +1 more source

Design of 7T SRAM Using InGaAs-Dual Pocket-Dual Gate-Tunnel FET for IoT Applications

open access: yesIEEE Access, 2023
The Internet of Things (IoT) is becoming increasingly popular in areas like wearable communication devices, biomedical devices, and home automation systems.
Gadarapulla Rasheed   +1 more
doaj   +1 more source

Atomic Layer Deposition in Transistors and Monolithic 3D Integration

open access: yesAdvanced Functional Materials, Volume 36, Issue 41, 21 May 2026.
Transistors are fundamental building blocks of modern electronics. This review summarizes recent progress in atomic layer deposition (ALD) for the synthesis of two‐dimensional (2D) metal oxides and transition‐metal dichalcogenides (TMDCs), with particular emphasis on their enabling role in monolithic three‐dimensional (M3D) integration for next ...
Yue Liu   +5 more
wiley   +1 more source

Ultra-Low-Power compact TFET Flip-Flop design for high-performance low-voltage applications [PDF]

open access: yes, 2016
International audienceIn this paper, we propose a novel TFET Flip-Flop (TFET-FF) designed to address the requirements of ULP (Ultra-Low-Power) applications, like IoT (Internet of Things), while maintaining high performance.
Makosiej, Adam   +9 more
core   +1 more source

Emerging single‐element ferroelectrics: From theory to experiment

open access: yesInfoMat, Volume 8, Issue 4, April 2026.
This review explores recent developments in single‐element ferroelectrics, covering mechanisms of ferroelectric behavior, their crystal structures, key preparation methods, ferroelectric performance characteristics, and promising device applications in field‐effect transistors, photodetectors, and visual perceptrons.
Run Zhao   +7 more
wiley   +1 more source

A High-Performance InAs/GaSb Core-Shell Nanowire Line-Tunneling TFET: An Atomistic Mode-Space NEGF Study

open access: yesIEEE Journal of the Electron Devices Society, 2019
Using a tight-binding mode-space NEGF technique, we explore the essential physics, design and performance potential of the III-V core-shell (CS) nanowire (NW) heterojunction tunneling field-effect transistor (TFET).
Aryan Afzalian   +4 more
doaj   +1 more source

Investigation of gate leakage current in TFET: A semi-numerical approach

open access: yesAlexandria Engineering Journal, 2023
Tunneling FET (TFET) has been demonstrated as a favorable candidate to replace conventional MOSFETs in low-power applications. However, there are many challenges that should be overcome to efficiently operate the TFET.
N.M.S. Tawfik   +6 more
doaj   +1 more source

High‐Performance and Energy‐Efficient Sub‐5 nm 2D Double‐Gate MOSFETs Based on Silicon Arsenide Monolayers

open access: yesAdvanced Electronic Materials, Volume 12, Issue 5, 9 March 2026.
Sub‐5 nm double‐gate MOSFETs based on 2D SiAs monolayers are investigated using quantum transport simulations. By engineering source‐drain underlap regions, the devices achieve exceptional on‐currents of up to 1206 µA µm−1, surpassing the ITRS 2028 high‐performance targets.
Dogukan Hazar Ozbey, Engin Durgun
wiley   +1 more source

Impact of process and device dimensions on Bio-TFET Sensitivity [PDF]

open access: yes, 2019
This paper reports the impact of process and dimensions on the sensitivity of the double gate Bio-TFET for drain and source underlap structures. The Bio-TFET is simulated using different dielectric permittivity materials localized over the drain to gate ...
Agopian, P. G.D. [UNESP]   +2 more
core   +1 more source

From 32 nm to TFET Technology: New Perspectives for Ultra-Scaled RF-DC Multiplier Circuits [PDF]

open access: yes, 2021
International audienceIn this present work, different Cross-Coupled Differential Drive (CCDD) CMOS bridge rectifiers are designed using either 32 nm or Tunnel-FET (TFET) technology.
Taco, Ramiro   +4 more
core   +1 more source

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