Results 51 to 60 of about 2,142 (219)

Design of 7T SRAM Using InGaAs-Dual Pocket-Dual Gate-Tunnel FET for IoT Applications

open access: yesIEEE Access, 2023
The Internet of Things (IoT) is becoming increasingly popular in areas like wearable communication devices, biomedical devices, and home automation systems.
Gadarapulla Rasheed   +1 more
doaj   +1 more source

Emerging single‐element ferroelectrics: From theory to experiment

open access: yesInfoMat, Volume 8, Issue 4, April 2026.
This review explores recent developments in single‐element ferroelectrics, covering mechanisms of ferroelectric behavior, their crystal structures, key preparation methods, ferroelectric performance characteristics, and promising device applications in field‐effect transistors, photodetectors, and visual perceptrons.
Run Zhao   +7 more
wiley   +1 more source

Prospects of Tunnel FETs in the Design of Power Management Circuits for Weak Energy Harvesting DC Sources

open access: yesIEEE Journal of the Electron Devices Society, 2018
In this paper, a new tunnel FET (TFET)-based power management circuit (PMC) is proposed for weak dc energy harvesting sources. Thanks to their particular carrier injection mechanisms, TFETs can be used to design efficient energy harvesting circuits by ...
David Nunes Cavalheiro   +2 more
doaj   +1 more source

Graphene antidot nanoribbon tunnel field‐effect transistor

open access: yesMicro & Nano Letters, 2022
A graphene nanoribbon tunnel field‐effect transistor (TFET) model is proposed, in which the antidot pattern is used to generate the heterojunction (HJ) band structure.
Zhixing Xiao
doaj   +1 more source

High‐Performance and Energy‐Efficient Sub‐5 nm 2D Double‐Gate MOSFETs Based on Silicon Arsenide Monolayers

open access: yesAdvanced Electronic Materials, Volume 12, Issue 5, 9 March 2026.
Sub‐5 nm double‐gate MOSFETs based on 2D SiAs monolayers are investigated using quantum transport simulations. By engineering source‐drain underlap regions, the devices achieve exceptional on‐currents of up to 1206 µA µm−1, surpassing the ITRS 2028 high‐performance targets.
Dogukan Hazar Ozbey, Engin Durgun
wiley   +1 more source

Comparative performance analysis of different gate structure engineering on double gate tunnel FET

open access: yesNext Materials
Through band-to-band tunneling, Tunnel Field Effect Transistors (TFETs) reduce leakage and subthreshold swing, giving them an advantage over MOSFET. However, ambipolar conduction and low ON state current are problems with traditional TFET.
Sudha Subhalaxmi Muduli   +3 more
doaj   +1 more source

Low Power and Energy‐Efficient Design of MTJ/FinFET Circuits

open access: yesEngineering Reports, Volume 8, Issue 3, March 2026.
This work begins by outlining the fundamental concepts of MTJs, FinFETs, and the conventional hybrid CMOS/MTJ framework. It then explains the operating mechanism and configuration of the proposed STT‐MTJ/FinFET‐based OR logic gate. The final sections present the simulation outcomes and analyze the influence of FinFET fin variation.
Pillem Ramesh, Atul S. M. Tripathi
wiley   +1 more source

Investigation of Single-Event-Transient Effects Induced by Heavy-Ion in All-Silicon DG-TFET

open access: yesIEEE Access, 2022
The heavy-ion analysis is a single-event-effect (SEE) that produces a single-event-transient (SET) pulse of current. In this work, the analysis was done to observe the maximum impact of heavy-ions on a calibrated double-gate tunnel field-effect ...
Ashish Maurya   +3 more
doaj   +1 more source

Design and TCAD Simulation of p+–n+ InAs‐Based TFET

open access: yesNano Select, Volume 7, Issue 3, March 2026.
A physics‐based design and optimization of a p+−n+${{p}^ + } - {{n}^ + }$ InAs tunnel field‐effect transistor is presented using calibrated quantum‐corrected TCAD simulations. By employing a composite figure of merit that unifies digital and RF metrics, the proposed homojunction architecture achieves steep subthreshold swing, enhanced cutoff frequency,
Muhammad Elgamal   +5 more
wiley   +1 more source

Impacts of Work Function Variation and Line-Edge Roughness on TFET and FinFET Devices and 32-Bit CLA Circuits

open access: yesJournal of Low Power Electronics and Applications, 2015
In this paper, we analyze the variability of III-V homojunction tunnel FET (TFET) and FinFET devices and 32-bit carry-lookahead adder (CLA) circuit operating in near-threshold region.
Yin-Nien Chen   +5 more
doaj   +1 more source

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