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Characterization of Charge Plasma-based Junctionless Tunneling Field Effect Transistor (JL-TFET)

2020 IEEE International Symposium on Smart Electronic Systems (iSES) (Formerly iNiS), 2020
The steep doping profile associated with conventional Tunneling Field Effect Transistor (TFET) provides significant hindrances from a fabrication perspective despite the obvious merits of the device. Junctionless TFET (JL-TFET) alleviates the problem considerably by introducing a uniform doping profile across the device.
Nafis Mustakim   +2 more
openaire   +1 more source

Scaling properties of the tunneling field effect transistor (TFET): Device and circuit

Solid-State Electronics, 2006
Abstract The scaling properties of the tunneling field effect transistor (TFET) are shown using standard 130 nm, 90 nm, and 65 nm CMOS process flows. For the different technology nodes the temperature dependence is presented. The device characteristic does not show degradation after a combined voltage and temperature cycle.
Th. Nirschl   +19 more
openaire   +1 more source

The impact of scaled channel length in tunneling field effect transistors (TFETs)

2014 IEEE International Conference on Semiconductor Electronics (ICSE2014), 2014
In this paper, we investigate the channel length (L CH ) of the silicon-on-insulator (SOI) n-type tunneling field effect transistor (NTFET) with the respect of device performance. 2D-device simulation was used for simulating the devices with 30 nm gate length of SOI NTFET with 10 nm thin buried oxide (t BOX ) and 7 nm thin silicon body (t si ).
Nurul Huda Abdul Rahman   +5 more
openaire   +1 more source

A Comparative Study of Material Impact on Tunnel Field-Effect Transistor (TFET) Performance

2024 International Conference on Emerging Trends in Networks and Computer Communications (ETNCC)
Pradipta Dutta
exaly   +2 more sources

The tunnelling field effect transistors (TFET): the temperature dependence, the simulation model, and its application

2004 IEEE International Symposium on Circuits and Systems (ISCAS), 2004
The TFET is an alternative device for deep sub-micron CMOS with very good short channel and leakage characteristics. The paper presents investigations on properties important for circuit implementation: measurements are performed to verify the working principle and the temperature dependence of the TFET.
Thomas Nirschl   +3 more
openaire   +1 more source

The 1T photo pixel cell using the tunneling field effect transistor (TFET)

Digest of Technical Papers. 2005 Symposium on VLSI Circuits, 2005., 2005
The tunneling field effect transistor (TFET) is a quantum-mechanical device which is able to extend the epoch of the standard CMOS process by offering reduced short channel effects and smaller leakage currents. First, the mode of operation of the TFET is presented. Next, the application as photo pixel cell is proposed comprising only one device.
T. Nirschl   +7 more
openaire   +1 more source

Temperature Influence on Tunnel Field Effect Transistors (TFETs) with Low Ambipolar Currents

ECS Transactions, 2011
This work presents a study of the temperature impact on tunnel field effect transistors performance. After design considerations regarding undesirable ambipolar currents, TFETs were simulated for temperatures ranging from 100 to 400 K. Bearing this objective in mind, the influence of each one of the most relevant transport mechanisms was analyzed and ...
Marcio D. Martino   +3 more
openaire   +1 more source

Performance analysis of different Tunnel Field Effect Transistors (TFET) device structures with their Challenges

2021 8th International Conference on Signal Processing and Integrated Networks (SPIN), 2021
Tunnel Field Effect Transistor (TFET) is emerging as a suitable device to operate at a very low power. TFET overcomes the challenges faced by MOSFET based on its different switching mechanisms of band to band tunneling (BTBT) which makes it unique in terms of very low power consumption. TFET facilities steeper slope(
Shilpi Gupta, Subodh Wariya
openaire   +1 more source

Impact of gate dielectric constant variation on tunnel field-effect transistors (TFETs)

Solid-State Electronics, 2016
Abstract The influence of gate dielectric constant variation on tunnel field-effect transistors (TFETs) has been investigated. High- κ materials in polycrystalline nature induce localized gate dielectric constant variation. According to the simulation results, TFETs show larger standard deviation of threshold voltage ( V th ), subthreshold swing ...
Seung Kyu Kim, Woo Young Choi
openaire   +1 more source

Two-Dimensional Potential-Based Model for Tunnel Field-Effect Transistor (TFET)

2020
In this paper, we propose a two-dimensional analytical model of silicon-on-insulator tunneling field-effect transistors (SOI TFETs) by applying the superposition principle. By solving 2D Poisson’s equation with the help of boundary conditions of channel region and gate oxide region, we calculated the surface potential and electric field for both ...
Netravathi Kulkarni, P. Vimala
openaire   +1 more source

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