Results 11 to 20 of about 4,326 (205)
Model‐Inversion‐Resistant Physical Unclonable Neural Network Using Vertical NAND Flash Memory
The growing use of neural networks in privacy‐sensitive applications necessitates architectures that inherently protect both data and model integrity.
Sung‐Ho Park +8 more
doaj +2 more sources
Machine Learning Based Optimization Technique for High-Capacity V-NAND Flash Memory [PDF]
Abstract In the NAND flash manufacturing process, thousands of internal electronic fuses (eFuse) are tuned in order to optimize performance and validity. In this paper, we propose a machine learning optimization technique that uses deep learning (DL) and genetic algorithms (GA) to automatically tune eFuse values.
Jisuk Kim +14 more
openaire +1 more source
Electrical Screening Method of V-NAND Flash Channel Hole Bending Defects [PDF]
Abstract This paper presents a novel approach for detecting channel hole bending (ChB) defects in vertical NAND flash memory. Such defects are the result of etching process inconsistencies and contribute to data loss and device failure by inducing leakage current between adjacent channel holes.
Dooyeun Jung +10 more
openaire +1 more source
Monolithic Dual-Gate E-Mode Device-Based NAND Logic Block for GaN MIS-HEMTs IC Platform
In this work, dual-gate enhancement-mode (E-mode) device based NAND circuit (DG-NAND) and the NAND block with double E-mode devices (DD-NAND) are developed and fabricated based on the GaN MIS-HEMTs (metal-insulator-semiconductor-high-electron-mobility ...
Yuhao Zhu +8 more
doaj +1 more source
As a strong candidate for computing in memory, 3D NAND flash memory has attracted great attention due to the high computing efficiency, which outperforms the conventional von-Neumann architecture. To ensure 3D NAND flash memory is truly integrated in the
Xinyue Yu +6 more
doaj +1 more source
Self-Adaption of the GIDL Erase Promotes Stacking More Layers in 3D NAND Flash
The bit density is generally increased by stacking more layers in 3D NAND Flash. Gate-induced drain leakage (GIDL) erase is a critical enabler in the future development of 3D NAND Flash.
Tao Yang +4 more
doaj +1 more source
A machine-learning (ML) technique was used to optimize the energetic-trap distributions of nano-scaled charge trap nitride (CTN) in 3D NAND Flash to widen the threshold voltage (Vth) window, which is crucial for NAND operation.
Kihoon Nam +10 more
doaj +1 more source
Effect of the Blocking Oxide Layer With Asymmetric Taper Angles in 3-D NAND Flash Memories
The tapered channel effect is a major concern in three-dimensional (3-D) NAND technology because the effect causes differences in the electrical characteristics, including the threshold voltage (VT), between the upper and the lower cells.
Jun Gyu Lee +4 more
doaj +1 more source
Three-dimensional NAND flash memory with high carrier injection efficiency has been of great interest to computing in memory for its stronger capability to deal with big data than that of conventional von Neumann architecture.
Hongsheng Hu +8 more
doaj +1 more source
For triple-level or quad-level 3D NAND flash memory, narrowing the Vth distribution of each state without influencing page program performance is one of the challenges.
Zhichao Du +6 more
doaj +1 more source

