Results 31 to 40 of about 3,668 (177)

Effect of the Blocking Oxide Layer With Asymmetric Taper Angles in 3-D NAND Flash Memories

open access: yesIEEE Journal of the Electron Devices Society, 2021
The tapered channel effect is a major concern in three-dimensional (3-D) NAND technology because the effect causes differences in the electrical characteristics, including the threshold voltage (VT), between the upper and the lower cells.
Jun Gyu Lee   +4 more
doaj   +1 more source

Controlling the Carrier Injection Efficiency in 3D Nanocrystalline Silicon Floating Gate Memory by Novel Design of Control Layer

open access: yesNanomaterials, 2023
Three-dimensional NAND flash memory with high carrier injection efficiency has been of great interest to computing in memory for its stronger capability to deal with big data than that of conventional von Neumann architecture.
Hongsheng Hu   +8 more
doaj   +1 more source

Adaptive Pulse Programming Scheme for Improving the Vth Distribution and Program Performance in 3D NAND Flash Memory

open access: yesIEEE Journal of the Electron Devices Society, 2021
For triple-level or quad-level 3D NAND flash memory, narrowing the Vth distribution of each state without influencing page program performance is one of the challenges.
Zhichao Du   +6 more
doaj   +1 more source

Adaptive Bitline Voltage Countermeasure for Neighbor Wordline Interference in 3D NAND Flash Memory-Based Sensors

open access: yesSensors, 2023
Three-dimensional NAND flash memory is widely used in sensor systems as an advanced storage medium that ensures system stability through fast data access. However, in flash memory, as the number of cell bits increases and the process pitch keeps scaling,
Hanshui Fan   +6 more
doaj   +1 more source

Automated Metrology on the Verticality of Cross-Sectioned Channel Hole at V-NAND with Over 200 Layers by Transmission Electron Microscope [PDF]

open access: yesInternational Symposium for Testing and Failure Analysis, 2021
Abstract This paper describes the development and implementation of a TEM-based measurement procedure and shows how it is used to determine the verticality or etching angle of channel holes in V-NAND flash with more than 200 layers of memory cells.
Dong-yeob Kim   +2 more
openaire   +1 more source

Effect of Noncircular Channel on Distribution of Threshold Voltage in 3D NAND Flash Memory

open access: yesMicromachines, 2023
The instability in threshold voltage (VTH) and charge distributions in noncircular cells of three-dimensional (3D) NAND flash memory are investigated.
Donghyun Go   +6 more
doaj   +1 more source

Match‐line control unit for power and delay reduction in hybrid CAM

open access: yesIET Circuits, Devices and Systems, 2021
Content addressable memory (CAM) is a hardware search engine utilised for accelerating translation and table look‐up in network routers and data processing systems.
Sheikh Wasmir Hussain   +3 more
doaj   +1 more source

Investigation of Poly Silicon Channel Variation in Vertical 3D NAND Flash Memory

open access: yesIEEE Access, 2022
Since the most of three dimensional (3D) NAND devices’ channel is composed of polysilicon grain, the actual 3D NAND channel has a wave-shaped channel, not uniform shape.
Inyoung Lee   +3 more
doaj   +1 more source

Controlling the beam angle spread of carbon implantation for improvement of bin map defect in V-NAND flash memory

open access: yesMemories - Materials, Devices, Circuits and Systems, 2023
As the shrinkage of devices accelerates and the vertical layers increase, beam angle spread of carbon ion implantation (C IIP) for the silicon selective epitaxial growth (Si-SEG) areas in V-NAND is one of the most critical parameters related with bin map defects.
Gui-Fu Yang   +6 more
openaire   +2 more sources

Low-voltage solution-processed Cuprous thiocyanate Thin-Film transistors with NAND logic function

open access: yesResults in Physics, 2023
Coprous thiocyanate (CuSCN)-based thin-film transistors (TFTs) by solution-processed chitosan electrolyte are fabricated on glass substrates. Such TFTs show a low operation voltage of −2.0 V due to the large specific gate capacitance of 7.65 μF/cm2 ...
Liuhui Lei   +7 more
doaj   +1 more source

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