Results 71 to 80 of about 5,102 (147)
Random telegraph noise (RTN) shifts the threshold voltage (Vt) of 3D NAND flash memory cells, making it a key factor of the device malfunction. The aim of this study is to predict the distribution of RTN induced ${\mathrm { V}}_{\mathrm { t}}$ shift in
Eunseok Oh, Hyungcheol Shin
doaj +1 more source
Processing‐in‐memory (PIM) architectures based on memristors offer significant potential for low‐power computation and the realization of novel computing paradigms by performing logic operations directly within memory. This review summarizes recent advances in memristor‐based logic techniques, with particular emphasis on reliability considerations and ...
Thomas Neuner +5 more
wiley +1 more source
Ferroelectric HZO Thin Films for FEFETs: Crystal Structure‐Device Performance Relationship
Crystal Structure of HZO Thin Films Methods of Thin Film Deposition 1T‐FeFET Design Influence on Ferroelectric Properties FeFET Applications Recent Advances and Challenges ORTHORHOMBIC HEARTBEAT. Abstract The rapid development of hafnium zirconium oxide (HZO) thin films has established ferroelectric field‐effect transistors (FeFETs) as strong ...
Harsha Ragini Aturi +2 more
wiley +1 more source
Heavy Ion and Proton-Induced Single Event Upset Characteristics of a 3D NAND Flash Memory [PDF]
We evaluated the effects of heavy ion and proton irradiation for a 3D NAND flash. The 3D NAND showed similar single-event upset (SEU) sensitivity to a planar NAND of identical density in the multiple-cell level (MLC) storage mode.
Chen, Dakai +6 more
core +1 more source
This review surveys how PVDF's ferroelectric behavior emerges from structure, processing, and phase engineering, and how it translates into memory, neuromorphic, and sensing technologies. Performance is benchmarked against leading inorganic ferroelectrics, while composites and hybrid systems are discussed as routes to improved endurance and ...
Achidi Frick +3 more
wiley +1 more source
HfO2‐based ferroelectric materials are promising for next‐generation memory technologies by providing outstanding performance aligning with data‐centric computing needs. This review details recent advancements in materials, devices, and integration for HfO2‐based memories, with the goal of identifying both the technological opportunities and remaining ...
Zuopu Zhou +9 more
wiley +1 more source
Photodoping has emerged as a promising alternative, offering non‐destructive, reversible, and highly tunable performance modulation of atomically thin two‐dimensional (2D) materials while overcoming the limitations of traditional silicon‐based doping methods.
Zhe Zhang +7 more
wiley +1 more source
Data storage in electronic devices has been revolutionised by 3D NAND flash memory. However, polycrystalline silicon and grain boundaries offer issues that greatly affect memory performance in terms of string current and Program-Erase Threshold Voltage ...
Dikendra Verma +2 more
doaj +1 more source
An Improved Dimensional Measurement Method of Staircase Patterns With Higher Precision in 3D NAND
3D NAND is a great architectural innovation in the field of flash memory. The staircase for control gate is a unique and important process in the manufacturing of 3D NAND.
Peizhen Hong +7 more
doaj +1 more source
The Pt/Ta2O5/Nb2O5−x/Au nanoparticles/Al2O3−y/Ti charge trap memristor (CTM) demonstrates faster and energy‐efficient operation compared to its counterpart without Au nanoparticles. This improvement is attributed to the synergistic effects of localized electric field enhancement and optimized electron trapping via band engineering. The findings present
Geunyoung Kim +6 more
wiley +1 more source

