Investigating Surface Morphology and Subsurface Damage Evolution in Nanoscratching of Single-Crystal 4H-SiC. [PDF]
Xi J, Ban X, Hui Z, Ba W, Deng L, Qiu H.
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A High-Temperature Stable Ohmic Contact Process on Lightly Doped n-Type 4H-SiC Based on a W/C Multilayer Structure. [PDF]
Zhou Y +7 more
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A Trench Heterojunction Diode-Integrated 4H-SiC LDMOS with Enhanced Reverse Recovery Characteristics. [PDF]
Liu Y, Bai F, Fang J.
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Power-Law Time Exponent <i>n</i> and Time-to-Failure in 4H-SiC MOSFETs: Beyond Fixed Reaction-Diffusion Theory. [PDF]
Dhyani M +3 more
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Impact of Processing Parameters on Ti Schottky Contacts on 4H-SiC. [PDF]
Vivona M +7 more
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Dislocations in 4H-SiC Epilayers
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Experiment and Analysis of Termination Robustness Design for 1200 V 4H-SiC MOSFET. [PDF]
Yu M, Shen Y, Ma H, Zhang Q.
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Micro-nanoscale laser subsurface vertical modification of 4H-SiC semiconductor materials: mechanisms, processes, and challenges. [PDF]
Li H +6 more
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Tunable Doping and Optoelectronic Modulation in Graphene-Covered 4H-SiC Surfaces. [PDF]
Mansouri M, Martín F, Díaz C.
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