Results 161 to 170 of about 19,738 (219)
Molecular dynamics simulating the effects of Shockley-type stacking faults on the radiation displacement cascades in 4H-SiC. [PDF]
Jiang S +7 more
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Research on the Influence of Carbon Sources and Buffer Layers on the Homogeneous Epitaxial Growth of 4H-SiC. [PDF]
Yuan W +5 more
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High-Breakdown and Low-Leakage 4H-SiC MOS Capacitor Based on HfO<sub>2</sub>/SiO<sub>2</sub> Stacked Gate Dielectric in Trench Structures. [PDF]
Huang Q +8 more
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A Novel 4H-SiC SGT MOSFET with Improved P+ Shielding Region and Integrated Schottky Barrier Diode. [PDF]
Cao X, Liu J, An Y, Ren X, Yin Z.
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Selective embedded growth of 4H-SiC trenches in 4H-SiC(0001) substrates using carbon mask
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Fabrication and characterization of CuAlO2/ 4H–SiC heterostructure on 4H–SiC (0001)
Superlattices and Microstructures, 2021Abstract In this work, CuAlO2 films were prepared on 4H–SiC (0001) using the sol-gel method. The surface morphology, structure and optical characteristics of the prepared films were studied. A homogeneous distribution of fine rhombohedral crystal structural grains is observed on the 4H–SiC substrate using scanning electron microscope (SEM).
Jichao Hu +6 more
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Physical Review Letters, 2006
Electron paramagnetic resonance and ab initio supercell calculations suggest that the P6/P7 centers, which were previously assigned to the photoexcited triplet states of the carbon vacancy-antisite pairs in the double positive charge state, are related to the triplet ground states of the neutral divacancy. The spin density is found to be located mainly
N T, Son +10 more
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Electron paramagnetic resonance and ab initio supercell calculations suggest that the P6/P7 centers, which were previously assigned to the photoexcited triplet states of the carbon vacancy-antisite pairs in the double positive charge state, are related to the triplet ground states of the neutral divacancy. The spin density is found to be located mainly
N T, Son +10 more
openaire +2 more sources
Helium implantation into 4H‐SiC
physica status solidi (a), 2009AbstractThe paper provides the properties of single crystalline 4H‐SiC under helium implantation at temperatures of implantation up to 750 °C and fluences in the range 5 × 1015–1 × 1017 cm−2. The microstructure evolution was studied by transmission electron microscopy cross‐section and X‐ray diffraction experiments. The mechanical property changes were
Barbot, J-F. +11 more
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