Results 41 to 50 of about 34,979 (291)

Metal mask free dry-etching process for integrated optical devices applying highly photostabilized resist. [PDF]

open access: yes, 2006
Photostabilization is a widely used post lithographic resist treatment process, which allows to harden the resist profile in order to maintain critical dimensions and to increase selectivity in subsequent process steps such as reactive ion etching.
Driessen, A.   +3 more
core   +1 more source

Cryogenic silicon surface ion trap [PDF]

open access: yes, 2014
Trapped ions are pre-eminent candidates for building quantum information processors and quantum simulators. They have been used to demonstrate quantum gates and algorithms, quantum error correction, and basic quantum simulations.
Blatt, Rainer   +6 more
core   +1 more source

Mask material effects in cryogenic deep reactive ion etching [PDF]

open access: yesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2007
Cryogenic silicon etching in inductively coupled SF6∕O2 plasma has been studied, especially the behavior of mask materials. Suitability of eight different mask materials for cryogenic silicon deep reactive ion etching has been investigated. Three of the five photoresists suffered from cracking during cryogenic etching.
Franssila, Sami, Sainiemi, Lauri
openaire   +2 more sources

Packaging of Macroscopic Material Payloads: Needs, Challenges, Concepts, and Future Directions

open access: yesAdvanced Engineering Materials, EarlyView.
This review introduces a unified framework that decomposes any macroscopic packaging system into the payload, packaging material, and packaging strategy and combines them into a conceptual packaging equation: packaging strategy = payload + packaging material.
Venkata S. R. Jampani, Manos Anyfantakis
wiley   +1 more source

Tailored Hierarchical Porous Copper Architectures via Three Dimensional Printing and Pressure‐less Sintering for Next‐Generation Lithium‐Metal Batteries

open access: yesAdvanced Engineering Materials, EarlyView.
A hierarchical porous copper current collector is fabricated via three‐dimensional printing combined with pressureless sintering to stabilize lithium metal anodes. The interconnected architecture lowers local current density, guides uniform Li deposition within pores, and suppresses dendrite growth.
Alok Kumar Mishra, Mukul Shukla
wiley   +1 more source

An Investigation of Processes for Glass Micromachining

open access: yesMicromachines, 2016
This paper presents processes for glass micromachining, including sandblast, wet etching, reactive ion etching (RIE), and glass reflow techniques.
Nguyen Van Toan   +2 more
doaj   +1 more source

A Method for Improving Heat Dissipation and Avoiding Charging Effects for Cavity Silicon-on-Glass Structures

open access: yesActuators, 2023
Anode bonding is a widely used method for fabricating devices with suspended structures, and this approach is often combined with deep reactive-ion etching (DRIE) for releasing the device; however, the DRIE process with a glass substrate can potentially ...
Junduo Wang   +4 more
doaj   +1 more source

Parylene etching techniques for microfluidics and bioMEMS [PDF]

open access: yes, 2005
Parylene C (poly(monochloro-p-xylylene)) is a member of a unique family of thermoplastic, crystalline polymers. Compared to other polymers, parylene films are exceptionally conformal and chemically inert owing to its vapor deposition polymerization (VDP)
Meng, Ellis, Tai, Yu-Chong
core   +1 more source

Effect of Laser Deoxidation on Adhesive‐Bonded Aluminum in an Oxygen‐Free Atmosphere

open access: yesAdvanced Engineering Materials, EarlyView.
This study investigates laser ablation of aluminum under oxygen‐free conditions. The goal is to produce oxide‐free substrates that enable improved adhesive bonding with epoxy. Optimized laser parameters (90% overlap, 300 µJ) combined with oxide‐free substrates result in the highest tensile strength of the adhesive bond.
Sandra Gerland   +5 more
wiley   +1 more source

Ion-exchanged waveguide add/drop filter [PDF]

open access: yes, 2001
An add/drop filter is fabricated using ion-exchanged waveguides and photowritten Bragg gratings. The device exhibits 20 dB extinction ratios and 3 dB bandwidths of 0.4 nm (100 GHz)
Geraghty, D. F.   +5 more
core   +2 more sources

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