Deep reactive ion etching drie - Open Access .click

SPIE Proceedings, 2005
In typical DRIE processes, the etch rate variation across the wafer increases with pattern density, severely limiting the pattern densities that can be used at a specified etch rate tolerance. Here, we present a scheme for including uniformity-improving dummy structures in the etch mask layout that enable the use of high-density patterns in many DRIE ...
Ole Hansen
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High-power optical microswitch fabricated by deep reactive ion etching (DRIE)

SPIE Proceedings, 2003
Development of a high power optical micro switch fabricated by deep reactive ion etching (DRIE) in silicon on insulator (SOI) substrates is presented. The devices discussed are a key component in a MEMS-based, Naval safety and arming (S&A) system for use in underwater weapons.
Don Devoe
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Developing terahertz filters using the deep reactive ion etching (DRIE) process

2016 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP), 2016
This paper introduces some recent developments of terahertz bandpass filters. By adopting dual-resonating-mode cavities, transmission zeroes are obtained in the design, which greatly improve the selectivity of the terahertz bandpass filters. As demonstrations, terahertz bandpass filters having a center frequency of 400 GHz have been fabricated by using
Zhang-Cheng Hao, Wei Hong
exaly +2 more sources

deep reactive ion etching
drie
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fabrication
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