Results 41 to 50 of about 2,694 (179)

Fabrication and electrochemical characterization of ruthenium nanoelectrodes

open access: yesCurrent Directions in Biomedical Engineering, 2017
The Fraunhofer IMS has recently developed a technique for producing nanoelectrodes that are generated by atomic layer deposition (ALD) in a via deep reactive ion etching (DRIE) structured sacrificial layer.
Allani Sonja   +4 more
doaj   +1 more source

Functional Disorder at the Neural Interface: How Disordered Nanostructures Promote Proper Growth and Differentiation in In Vitro Neural Cultures

open access: yesAdvanced Science, EarlyView.
This work provides a practical guide for neuroengineers to design advanced neural interfaces, embracing and tailoring the concept of functional disorder. By bridging 2D and 3D in vitro models, this work highlights how non‐periodic, spatially heterogeneous, multiscale nanotopography can enable more physiologically relevant platforms for studying neural ...
F. Maita   +4 more
wiley   +1 more source

DESIGN AND FABRICATION OF MICRONOZZLES

open access: yesInternational Islamic University Malaysia Engineering Journal, 2011
Micronozzle, a key component in micropropulsion system, has been designed and fabricated. Quasi 1D inviscid theory was used in designing a series of conical micronozzles of different expander half-angles (10°-50°).
Kean How Cheah, Jit Kai Chin
doaj   +1 more source

Friend, Not Foe: Lowered Tissue Reactivity to Long‐Term Polyimide Implants

open access: yesAdvanced Science, EarlyView.
The choice of optimal neural probe designs remains a major challenge in the field of neurotechnology. This study investigated the biocompatibility of several probe variations, including material, thickness, width, and implantation strategy. It highlights the clear advantage of soft polyimide probes over stiff silicon probes for better device ...
Corinne Orlemann   +11 more
wiley   +1 more source

Microfabrication of membrane-based devices by deep-reactive ion etching (DRIE) of silicon [PDF]

open access: yes, 1998
Deep reactive ion etching (DRIE) of silicon was utilized to fabricate dielectric membrane-based devices such as microhotplates, valves and flexural plate wave (FPW) devices. Through-wafer DRIE is characterized by fast etch rates ({approximately} 3 {micro}
Willison, Christi G.   +4 more
core  

Enhanced near-infrared absorber: two-step fabricated structured black silicon and its device application

open access: yesNanoscale Research Letters, 2018
Silicon is widely used in semiconductor industry but has poor performance in near-infrared photoelectronic devices because of its high reflectance and band gap limit.
Hao Zhong   +4 more
doaj   +1 more source

Redefining Crystalline Silicon: Unlocking New Horizons in Transparent and Flexible Photovoltaics

open access: yesAdvanced Energy Materials, EarlyView.
Crystalline silicon is presented as a platform for transparent and flexible photovoltaics. This review article outlines design principles for optical strategies to fabricate transparent silicon solar cells, mechanical strategies that mitigate silicon brittleness, and emerging concepts such as singlet‐fission spectral conversion and tandem architectures,
Kangmin Lee
wiley   +1 more source

New DRIE-Patterned Electrets for Vibration Energy Harvesting

open access: yesEPJ Web of Conferences, 2012
This paper is about a new manufacturing process aimed at developing stable SiO2/Si3N4 patterned electrets using a Deep Reactive Ion Etching (DRIE) step for an application in electret-based Vibration Energy Harvesters (e-VEH).
Chaillout J.-J.   +3 more
doaj   +1 more source

Fabrication of adhesive lenses using free surface shaping [PDF]

open access: yesJournal of the European Optical Society-Rapid Publications, 2013
Two approaches for fabricating polymer lenses are presented in this paper. Both are based on filling circular holes with UV curing adhesives. Initially, the viscous adhesive material creates a liquid and spherical free surface due to its own surface ...
Hoheisel D.   +4 more
doaj   +1 more source

Broadband Mode Converter With Customizable Modal Ratio Leveraging Subwavelength Engineering for Advanced Multimode Silicon Photonics

open access: yesLaser &Photonics Reviews, EarlyView.
This work introduces a customizable mode converter for multimode silicon photonics, enabling precise control over the conversion ratio between optical modes. The device operates across a broad wavelength range (1350–1700 nm) with 15 distinct conversion levels.
Raquel Fernández de Cabo   +7 more
wiley   +1 more source

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