Influence of LPCVD-Si<sub>3</sub>N<sub>4</sub> Thickness on Polarization Coulomb Field Scattering in AlGaN/GaN Metal-Insulator-Semiconductor High-Electron-Mobility Transistors. [PDF]
Jiang G +8 more
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Single-Crystalline Si Stacked AlGaN/GaN High-Electron-Mobility Transistors with Enhanced Two-Dimensional Electron Gas Density. [PDF]
Ham G +6 more
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High power density gallium nitride radio frequency transistors via enhanced nucleation in heteroepitaxy. [PDF]
Zhou H +25 more
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High Power Density X-Band GaN-on-Si HEMTs with 10.2 W/mm Used by Low Parasitic Gold-Free Ohmic Contact. [PDF]
Du J +12 more
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Photoelectrochemical Oxidation and Etching Methods Used in Fabrication of GaN-Based Metal-Oxide-Semiconductor High-Electron Mobility Transistors and Integrated Circuits: A Review. [PDF]
Lee CT, Lee HY.
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Self-Calibrating TSEP for Junction Temperature and RUL Prediction in GaN HEMTs. [PDF]
Cui Y +6 more
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Optimization of Low-Voltage p-GaN Gate HEMTs for High-Efficiency Secondary Power Conversion. [PDF]
Zhai L +13 more
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Improve Intermetal Dielectric Process for HTRB Stability in Power GaN High Electron Mobility Transistor (HEMT) by unbiased-Highly Accelerated Stress Testing (uHAST). [PDF]
Chuang YT, Tumilty N, Wu TL.
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