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GaAlN/GaN HEMT heterostructures grown on ‘SiCopSiC' composite substrates for HEMT application

2008
In this paper, we report on an innovative solution based on "composite substrates". The GaAlN/GaN HEMT structures are grown on SiCopSiC composite substrates made of thin single crystal SiC “seed layer” transferred on top of a thick polycrystalline SiC, following the "Smart Cut" technology developed by SOITEC.
Di Forte-Poisson, M.A.   +12 more
openaire   +2 more sources

Current-gain cutoff frequency comparison of InGaAs HEMTs

IEEE Electron Device Letters, 1988
S Sasa, K Hikosaka
exaly  

The indium content in metamorphic As/As HEMTs on GaAs substrate: a new structure parameter

Solid-State Electronics, 2000
Alain Cappy   +2 more
exaly  

HEMT Devices

1993
Masayuki Abe, Takashi Mimura
openaire   +1 more source

205-GHz (Al,In)N/GaN HEMTs

IEEE Electron Device Letters, 2010
Raphaël Butte   +2 more
exaly  

50 nm metamorphic GaAs and InP HEMTs

Thin Solid Films, 2007
Stephen Thoms   +2 more
exaly  

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