Results 141 to 150 of about 236 (173)
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An accurate scalable model for 700V LDMOS
2016 China Semiconductor Technology International Conference (CSTIC), 2016This paper discusses a highly scalable model of 700V LDMOS (Lateral Diffused MOS) device. The device model includes several key steps like self-heating characterization, parasitic resistance removing and dimension scalability. A SUBCKT approach is presented for accurate modeling of some special effects, such as quasi-saturation and gate/junction ...
Pingliang Li, Zhengnan Wang, Sunny Zhang
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Compact model of LDMOS for circuit simulation
2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings, 2006A new compact LDMOS is introduced in this paper for circuit simulation. Features covered in this model relevant for a LDMOS device include: unique bias dependent drift region resistance model accounting for velocity saturation, bias dependent overlap region resistance model, dual Isub model to model Iii current in different region in the device and ...
Yutao Ma +5 more
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2013 25th International Symposium on Power Semiconductor Devices & IC's (ISPSD), 2013
null Jaejune Jang +10 more
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null Jaejune Jang +10 more
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Review of the SiC LDMOS power device
Journal of SemiconductorsAbstract Silicon carbide (SiC), as a third-generation semiconductor material, possesses exceptional material properties that significantly enhance the performance of power devices. The SiC lateral double-diffused metal–oxide–semiconductor (LDMOS) power devices have undergone continuous optimization, resulting in an increase in breakdown ...
Ziwei Hu +9 more
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A novel BIST technique for LDMOS drivers
2014 IEEE 57th International Midwest Symposium on Circuits and Systems (MWSCAS), 2014Bruce C. Kim +3 more
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Capacitance Modelling of LDMOS Transistors
30th European Solid-State Device Research Conference, 2000E.C. Griffith +6 more
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Summary of Integration Concepts for LDMOS Transistors
2014The final chapter of this textbook summarizes the integration concepts presented in Chap. 5 through Chap. 9. Comparison of integration densities and figures-of-merit represent a first methodology to evaluate these concepts with respect to applications requiring high efficiency or performance. Another methodology for comparison of device technologies is
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An embedded β-Ga2O3 layer in a SOI-LDMOS to improve breakdown voltage
Journal of Computational Electronics, 2022Ali A Orouji +2 more
exaly

