Results 91 to 100 of about 1,326 (196)

Carbon‐Doped Amorphous Gallium Oxide Forms a Heterojunction With Water to Improve the Electrocatalytic Oxygen Evolution Reaction

Carbon Energy
The weak interactions between powdered catalysts and their supports significantly impact the kinetics of the water electrolysis oxidation reaction. Here, we use plasma‐enhanced atomic layer deposition (PEALD) technology to directly construct amorphous ...
Ruijie Dai, Yuwan Xiang, Jueyu Chen, Guoyong Fang, Xi'an Chen, Daying Guo, Bin Xi   +6 more
doaj   +1 more source

Ultra-Thin Al₂O₃ Grown by PEALD for Low-Power Molybdenum Disulfide Field-Effect Transistors

Journal of Low Power Electronics and Applications
The lack of ultra-thin, controllable dielectric layers poses challenges for reducing power consumption in 2D FETs. In this study, plasma-enhanced atomic layer deposition was employed to fabricate a highly reliable, ultra-thin aluminum oxide (Al2O3 ...
Shiwei Sun, Dinghao Ma, Boxi Ye, Guanshun Liu, Nanting Luo, Hao Huang   +5 more
doaj   +1 more source

Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al₂O₃

, 2017
In this paper, AlNO nano-films have been deposited on an AlGaN/GaN heterojunction by alternating growth of AlN and Al2O3 using plasma enhanced atomic layer deposition (PEALD).
Dongliang Zhang, Lingyan Shen, Jingjie Li, Li Zheng, Xinhong Cheng, Yuehui Yu, Ru Qian, Qian Wang   +7 more
core   +1 more source

Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer Deposition

Technologies
In this research, we mainly increase the adhesion of PMMA substrate and film, which is reflected in the environmental test. This study used plasma-enhanced atomic layer deposition (PEALD) to find the relationship between the intensity of XRD reflection ...
Chi-Chieh Wang, Cheng-Fu Wang, Meng-Chi Li, Li-Chen Su, Chien-Cheng Kuo   +4 more
doaj   +1 more source

Area selective deposition of TiO 2 by intercalation of plasma etching cycles in PEALD process: A bottom up approach for the simplification of 3D integration scheme

, 2019
International audienceA selective deposition process for bottom-up approach was developed in a modified plasma enhanced atomic layer deposition (PEALD) sequence.
Rémy Gassilloud, Vallée, Christophe, Rémi Vallat, El Hajjam, Khalil, Gassilloud, Rémy, Bernard Pelissier, Salicio, Olivier, Vallat, Rémi, Olivier Salicio, Christophe Vallée, Molas, Gabriel, Pelissier, Bernard, Khalil El Hajjam, Gabriel Molas   +13 more
core   +1 more source

Innovative stress-release method for low-stress flexible Al2O3 encapsulation films in OLED applications

npj Flexible Electronics
This study presents a low residual tensile stress, flexible thin film encapsulation with a 2 mm bending radius based on atomic layer deposition (ALD), specifically plasma-enhanced ALD (PEALD).
Guanran Wang, Zhenyu Wang, Jianyang Ren, Zhijun Wu, Yu Duan   +4 more
doaj   +1 more source

Electrical characteristics of top-down ZnO nanowire transistors using remote plasma ALD

Top-down fabrication is used to produce ZnO nanowires by remote plasma atomic layer deposition over a SiO2 pillar and anisotropic dry etching. Nanowire field-effect transistors (FETs), with channel lengths in the range of 1.3–18.6 µm, are then fabricated
Masaud, T.B., Ashburn, P., Fang, Q., Gunn, R., Allen, M. W., Partridge, J., Clark, O.D., Sultan, S.M., Sun, K., Chong, H.M.H.   +9 more
core   +1 more source

Indium Alloying as a Mobility Booster in IGZO Thin‐Film‐Transistor via Plasma‐Enhanced Atomic Layer Deposition Approach for BEOL Compatible Circuits

Advanced Electronic Materials
Indium Gallium Zinc Oxide (IGZO) thin‐film transistors (TFTs) offer promising potential for next‐gen monolithic three ‐ dimensional (M3D) integrated chips due to their decent mobility, excellent electrostatic characteristics, and low‐temp processing ...
Meishan Zhang, Mei Shen, Wenhui Wang, Jun Lan, Jiqing Lu, Yida Dong, Xiao Huang, Zhixiong Li, Longyang Lin, Yida Li   +9 more
doaj   +1 more source

Atomic Layer Deposition Processes: Versatile Platforms for Engineering ZnO-Chitosan Biointerfaces. [PDF]

Adv Healthc Mater
Moreno M, Devi A, Zanders D, Arredondo M, Mariotti D, McGlynn R, Devis S, Guerrero S, Benavente E, Alegría M, Olguin Y, Lobos-Gonzalez L, Guzmán K, Rivas-Yañez E, Solar P, Cepus V, Krause M, Velásquez L.   +17 more
europepmc   +1 more source

Manufacturing of quantum-tunneling MIM nanodiodes via rapid atmospheric CVD in terahertz band. [PDF]

Sci Rep, 2023
Ozyigit D, Ullah F, Gulsaran A, Bastug Azer B, Shahin A, Musselman K, Bajcsy M, Yavuz M.   +7 more
europepmc   +1 more source