Results 91 to 100 of about 5,793,656 (288)

Thermal and plasma enhanced atomic layer deposition of Al2O3on GaAs substrates [PDF]

, 2009
A good dielectric layer on the GaAs substrate is one of the critical issues to be solved for introducing GaAs as a candidate to replace Si in semiconductor processing.
Sioncke, S., Kessels, WMM Erwin, Delabie, Annelies, Delabie, A, Brammertz, Guy, Meuris, M, Sioncke, Sonja, Heyns, MM, Heyns, Marc, van Hemmen, J.L., Franquet, A, Conard, Thierry, Urbanczyk, A.J., Meuris, Marc, Urbanzcyk, Adam, Caymax, Matty, Sioncke, S, Meuris, M., Franquet, Alexis, Caymax, M, Caymax, M., Brammertz, G., Kessels, W.MM., Delabie, A., Hemmen, van, J.L., Urbanczyk, AJ Adam, Keuning, W Wytze, Franquet, A., Heyns, M.M., Brammertz, G, Conard, T, Hemmen, JL Hans van, Kessels, W.M.M., Conard, T., Keuning, W.   +34 more
core   +2 more sources

Binary‐to‐Ternary Reconfigurable Transistors Using Plasma‐Assisted MoS2

Advanced Functional Materials, EarlyView.
A binary‐to‐ternary reconfigurable transistor is demonstrated using a dual‐gated molybdenum disulfide homojunction with localized O2 plasma treatment. The device exhibits on/intermediate and intermediate/off current ratios of 102 and 104, respectively, and the intermediate state is electrically tunable in the ternary mode.
Yeonghyeon Ko, Jungi Song, Minsu Kim, Yongwook Seok, Seongje Moon, Kenji Watanabe, Takashi Taniguchi, Kayoung Lee   +7 more
wiley   +1 more source

Spatially Regulated Lithium Plating via Li2O‐Rich Interphase Enables Durable Fast‐Charging Hybrid Lithium Batteries

Advanced Functional Materials, EarlyView.
A Li2O‐rich solid electrolyte interphase (SEI) is engineered on graphite through a propylene carbonate‐based electrolyte to spatially regulate Li plating. The homogeneous interphase lowers Li nucleation barriers, promotes conformal Li deposition around graphite particles, and suppresses dendritic accumulation, enabling durable hybrid Li‐ion/Li‐metal ...
Robert Kuphal, Jingjing Liu, Junxiang Liu, Tao Ma, Yi Ding, Mahmood Haq, Satish Udpa, Stephen J. Harris, Chengcheng Fang   +8 more
wiley   +1 more source

Plasma-assisted atomic layer deposition of ultrathin oxide and metal films [PDF]

, 2009
Atomic layer deposition (ALD) is a thin film deposition method based on alternating saturated surface chemical reactions in which the self-limiting growth behavior allows for the deposition of ultrathin films with submonolayer control and with a high ...
Kessels, WMM Erwin, Kessels, W.M.M.
core   +1 more source

Remote plasma atomic layer deposition of Co3O4 thin films [PDF]

, 2011
Cobalt oxide thin films have been deposited with remote plasma atomic layer deposition (ALD) within a wide temperature window (100–400°C), using CoCp2 as a cobalt precursor and with remote O2 plasma as the oxidant source.
Kessels, WMM Erwin, M. C. M. van, Notten, P. H. L., W. M. M. Kessels, H. C. M. Knoops, Notten, PHL Peter, Notten, P.H. L., Knoops, H.C. M., Donders, M.E., P. H. L. Notten, Knoops, H.C.M.; id_orcid, Sanden, van de, M.C.M., Knoops, H.C.M., Knoops, HCM Harm, Sanden, MCM Richard van de, Knoops, H. C. M., Donders, ME Merijn, Notten, P.H.L., M. C. M. van de Sanden, Donders, M. E., Kessels, W.M. M., van de Sanden, M.C. M., M. E. Donders, Kessels, W.M.M., Kessels, W. M. M.   +24 more
core   +2 more sources

Dynamically Actuated Reconfigurable Topographical Surface Enables Active Control of Implant‐Associated Infections

Advanced Functional Materials, EarlyView.
A dynamically actuated reconfigurable topographical surface (DARTS) integrates contact‐mediated bactericidal nanotopography with programmable mechanical actuation to actively disrupt bacterial biofilms. Dynamic surface reconfiguration enhances bacterial killing and suppresses implant‐associated infections in vivo, providing a new strategy for active ...
Mohammad Asadi Tokmedash, Jihun Lee, J. Scott VanEpps, Sungmin Nam, Jouha Min   +4 more
wiley   +1 more source

Characterization of HZO Films Fabricated by Co-Plasma Atomic Layer Deposition for Ferroelectric Memory Applications

Nanomaterials
Plasma-enhanced atomic layer deposition (ALD) is a common method for fabricating Hf0.5Zr0.5O2 (HZO) ferroelectric thin films that can be performed using direct-plasma (DP) and remote-plasma (RP) methods.
Won-Ji Park, Ha-Jung Kim, Joung-Ho Lee, Jong-Hwan Kim, Sae-Hoon Uhm, So-Won Kim, Hee-Chul Lee   +6 more
doaj   +1 more source

Energy-enhanced atomic layer deposition : offering more processing freedom

, 2013
Atomic layer deposition (ALD) is a popular deposition technique comprising two or more sequential, self-limiting surface reactions, which make up an ALD cycle.
Potts, SE Stephen, Kessels, WMM Erwin, Potts, S.E., S.E. Potts, W.M.M. Kessels, Kessels, W.M.M.   +5 more
core   +1 more source

Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

, 2023
The effect of adding an atomic layer annealing step to a plasma-enhanced atomic layer deposition process of aluminum nitride was investigated with commonly available materials.
Mizohata, Kenichiro, Prozheev, Igor, Lipsanen, Harri, Kauppinen, Christoffer; id_orcid, Mizohata, K, Kauppinen, Christoffer, Seppanen, H, Lipsanen, H, Suihkonen, Sami, Prozheev, I, Seppänen, Heli, Suihkonen, S, Kauppinen, C   +12 more
core   +1 more source

Bio‐Inspired Artificial Ionic Mechanoreceptor

Advanced Functional Materials, EarlyView.
A skin‐inspired artificial mechanoreceptor based on ionic interactions is presented for biomimetic tactile sensing. Pressure‐driven ionic redistribution within microfluidic channels generates a self‐powered electrical signal without external bias. The generated waveform exhibits mechanoreceptor‐like temporal features, including overshoot and undershoot,
Mohammad Akbari, Jeppe Don, Lasse A. N. Pedersen, John Noee, Rassoul Tabassian   +4 more
wiley   +1 more source