Results 131 to 140 of about 95,287 (195)

Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition. [PDF]

Materials (Basel), 2019
Seppänen H, Kim I, Etula J, Ubyivovk E, Bouravleuv A, Lipsanen H.   +5 more
europepmc   +1 more source

Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition. [PDF]

Sci Rep, 2019
Li M, Jin ZX, Zhang W, Bai YH, Cao YQ, Li WM, Wu D, Li AD.   +7 more
europepmc   +1 more source

Atmospheric-pressure plasma-enhanced spatial Atomic Layer Deposition

, 2021
openaire   +1 more source

Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition. [PDF]

Nanomaterials (Basel), 2018
Ma HP, Lu HL, Yang JH, Li XX, Wang T, Huang W, Yuan GJ, Komarov FF, Zhang DW.   +8 more
europepmc   +1 more source

Systematic Study of the SiO_x Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiO_x/SiO₂ Super-Lattice. [PDF]

Nanomaterials (Basel), 2019
Ma HP, Yang JH, Yang JG, Zhu LY, Huang W, Yuan GJ, Feng JJ, Jen TC, Lu HL.   +8 more
europepmc   +1 more source

TiO_xN_y Modified TiO₂ Powders Prepared by Plasma Enhanced Atomic Layer Deposition for Highly Visible Light Photocatalysis. [PDF]

Sci Rep, 2018
Cao YQ, Zhao XR, Chen J, Zhang W, Li M, Zhu L, Zhang XJ, Wu D, Li AD.   +8 more
europepmc   +1 more source

Large-scale synthesis of uniform hexagonal boron nitride films by plasma-enhanced atomic layer deposition. [PDF]

Sci Rep, 2017
Park H, Kim TK, Cho SW, Jang HS, Lee SI, Choi SY.   +5 more
europepmc   +1 more source

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies. [PDF]

ACS Appl Mater Interfaces, 2018
Faraz T, Knoops HCM, Verheijen MA, van Helvoirt CAA, Karwal S, Sharma A, Beladiya V, Szeghalmi A, Hausmann DM, Henri J, Creatore M, Kessels WMM.   +11 more
europepmc   +1 more source

Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS. [PDF]

Materials (Basel), 2015
Ratzsch S, Kley EB, Tünnermann A, Szeghalmi A.   +3 more
europepmc   +1 more source

Interfacial, Electrical, and Band Alignment Characteristics of HfO₂/Ge Stacks with In Situ-Formed SiO₂ Interlayer by Plasma-Enhanced Atomic Layer Deposition. [PDF]

Nanoscale Res Lett, 2017
Cao YQ, Wu B, Wu D, Li AD.
europepmc   +1 more source