Plasma Enhanced Atomic Layer Deposition on Powders [PDF]
ECS Transactions, 2014 During the last decades atomic layer deposition (ALD) gained a lot of interest for coating three dimensional structures with ultrathin conformal films. Although mainly applied on silicon wafers in microelectronics and solar, experimental efforts confirmed the technique is also applicable to powders and particles.
Geert Rampelberg +3 more
core +5 more sources
Plasma-Enhanced Atomic Layer Deposition-Based Ferroelectric Field-Effect Transistors
IEEE Journal of the Electron Devices SocietyThe use of the plasma-enhanced atomic layer deposition (ALD) technique for the deposition of HfO2-based ferroelectrics has received attention in recent years primarily due to wake-up free operation.
Chinsung Park +13 more
doaj +2 more sources
Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)2 as a Metal Precursor [PDF]
Nanoscale Research Letters, 2019 For advanced Cu interconnect technology, Co films have been widely investigated to serve as the liner and seed layer replacement because of a better wettability to Cu than Ta.
Bao Zhu +5 more
doaj +2 more sources
Growth of GaN Thin Films Using Plasma Enhanced Atomic Layer Deposition: Effect of Ammonia-Containing Plasma Power on Residual Oxygen Capture [PDF]
International Journal of Molecular Sciences, 2022 Dong-Sing Wuu +2 more
exaly +2 more sources
AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition [PDF]
Nanoscale Research Letters, 2017 We report a low current collapse GaN-based high electron mobility transistor (HEMT) with an excellent thermal stability at 150 °C. The AlN was grown by N2-based plasma enhanced atomic layer deposition (PEALD) and shown a refractive index of 1.94 at 633 ...
An-Jye Tzou +11 more
doaj +2 more sources
Production of carbon nanotubes by PECVD and their applications to supercapacitors [PDF]
, 2010 Màster en Nanociència i NanotecnologiaPlasma enhanced chemical vapor deposition (PECVD) is a versatile technique to obtain vertically dense-aligned carbon nanotubes (CNTs) at lower temperatures than chemical vapor deposition (CVD).
Caglar, Burak
core +6 more sources
Plasma-Enhanced Atomic Layer Deposition Synthesis of Nanolayered Molybdenum Diselenide (MoSe2) Thin Films for Nanoelectronics [PDF]
ACS OmegaFabian Sanchez +9 more
doaj +2 more sources
Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching
Nanomaterials, 2022 The growing need for increasingly miniaturized devices has placed high importance and demands on nanofabrication technologies with high-quality, low temperatures, and low-cost techniques.
William Chiappim +9 more
doaj +1 more source
Self-limiting Nitrogen/Hydrogen Plasma Radical Chemistry in Plasma-Enhanced Atomic Layer Deposition of Cobalt [PDF]
, 2021 Cobalt (Co) is a potential candidate in replacing copper for interconnects and has been applied in the trenches in semiconductor industry over twenty years.
Ji, Liu +3 more
core +1 more source
Plasma-Enhanced Molecular Layer Deposition of Phosphane-ene Polymer Films [PDF]
, 2022 A vapour phase molecular layer deposition (MLD) process generating phosphorus-rich phosphane-ene polymer networks was adapted from known solution phase methods and successfully used in a commercial atomic layer deposition tool.
Christine, McGuiness +6 more
core +1 more source