Results 11 to 20 of about 17,661 (114)

Plasma-enhanced atomic layer deposition of titanium vanadium nitride [PDF]

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2018
The authors have studied the plasma-enhanced atomic layer deposition of TixV1−xN using tetrakis(dimethylamido) titanium, tetrakis(dimethylamido) vanadium, and nitrogen plasma. Through modification of the ratio of TiN to VN deposition cycles, the value of x can be well controlled.
Mark J. Sowa, Ling Ju, Alexander C. Kozen, Nicholas C. Strandwitz, Guosong Zeng, Tomas F. Babuska, Zakaria Hsain, Brandon A. Krick   +7 more
openaire   +3 more sources

Plasma-enhanced atomic layer deposition of Zn-doped GaP

Journal of Physics: Conference Series, 2021
Abstract The formation of p-type GaP by plasma-enhanced atomic layer deposition at a temperature of 380 °C has been studied. The incorporation of Zn impurity was detected by the method of glow discharge optical emission spectroscopy (GDOES).
A V Uvarov, A S Gudovskikh, A I Baranov, I A Morozov, D A Kudryashov   +4 more
openaire   +1 more source

Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition [PDF]

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2020
In this paper, the emerging role of ionic species in plasma assisted chemical deposition processes is discussed in detail for commemorating the Career of John Coburn, who studied the role of ionic species in plasma etching processes forty years ago. It is shown that, in both plasma enhanced chemical vapor deposition and plasma enhanced atomic layer ...
Christophe Vallée, Marceline Bonvalot, Samia Belahcen, Taguhi Yeghoyan, Moustapha Jaffal, Rémi Vallat, Ahmad Chaker, Gautier Lefèvre, Sylvain David, Ahmad Bsiesy, Nicolas Possémé, Rémy Gassilloud, Agnès Granier   +12 more
openaire   +2 more sources

Plasma-enhanced atomic layer deposition of Al2O3 on graphene via an in situ-deposited interlayer

Materials Science in Semiconductor Processing
Published by Elsevier Science, Amsterdam [u.a.]
Riazimehr, Sarah, Esteki, Ardeshir, Otto, Martin, Powell, Michael, Rinke, Gordon, Robertz, Bianca, Wang, Zhenxing, Lemme, Max C., Hore, Katie, Knoops, Harm   +9 more
openaire   +2 more sources

Uniformity of HfO₂ Thin Films Prepared on Trench Structures via Plasma-Enhanced Atomic Layer Deposition. [PDF]

Nanomaterials (Basel), 2022
Choi B, Kim HU, Jeon N.
europepmc   +1 more source

Comparative Study of Thermal and Plasma-Enhanced Atomic Layer Deposition of Iron Oxide Using Bis(N,N'-di-butylacetamidinato)iron(II). [PDF]

Nanomaterials (Basel), 2023
Choi B, Park GW, Jeong JR, Jeon N.
europepmc   +1 more source

Atomic-Level Sn Doping Effect in Ga₂O₃ Films Using Plasma-Enhanced Atomic Layer Deposition. [PDF]

Nanomaterials (Basel), 2022
Shen Y, Ma HP, Gu L, Zhang J, Huang W, Zhu JT, Zhang QC.   +6 more
europepmc   +1 more source

Influence of deposition temperature on microstructure and gas-barrier properties of Al₂O₃ prepared by plasma-enhanced atomic layer deposition on a polycarbonate substrate. [PDF]

RSC Adv, 2023
Ren Y, Sun X, Chen L, Wei H, Feng B, Chen J.   +5 more
europepmc   +1 more source

Effect of a ZrO₂ Seed Layer on an Hf_0.5Zr_0.5O₂ Ferroelectric Device Fabricated via Plasma Enhanced Atomic Layer Deposition. [PDF]

Materials (Basel), 2023
Song JN, Oh MJ, Yoon CB.
europepmc   +1 more source

Compact Ga₂O₃ Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition at Low Temperature. [PDF]

Nanomaterials (Basel), 2022
Yang Y, Zhang XY, Wang C, Ren FB, Zhu RF, Hsu CH, Wu WY, Wuu DS, Gao P, Ruan YJ, Lien SY, Zhu WZ.   +11 more
europepmc   +1 more source