Results 41 to 50 of about 5,793,656 (288)

Plasma-enhanced atomic layer deposition for plasmonic TiN (Erratum) [PDF]

Nanophotonic Materials XIII, 2020
Publisher’s Note: This paper, originally published on 3 October 2016, was replaced with a corrected version on 12 May 2020. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance.
Lauren M. Otto, Aeron T. Hammack, Shaul Aloni, D. Frank Ogletree, Deirdre L. Olynick, Scott D. Dhuey, Bethanie J. H. Stadler, Adam M. Schwartzberg   +7 more
openaire   +1 more source

Modelling water vapor permeability through atomic layer deposition coated photovoltaic barrier defects [PDF]

, 2014
Transparent barrier films such as Al2O3 used for prevention of oxygen and/or water vapour permeation are the subject of increasing research interest when used for the encapsulation of flexible photovoltaic modules.
Robbins, David, Sweeney, Francis, Elrawemi, Mohamed, Blunt, Liam, Fleming, Leigh, Bird, David   +5 more
core   +1 more source

Plasma-enhanced atomic layer deposition of vanadium nitride

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2019
This work describes process development and associated characterization of a plasma-enhanced atomic layer deposition process for vanadium nitride (VN) using tetrakis(dimethylamido)vanadium and nitrogen plasma over a deposition temperature range from 150 to 300 °C.
Alexander C. Kozen, Mark J. Sowa, Ling Ju, Nicholas C. Strandwitz, Guosong Zeng, Tomas F. Babuska, Zakaria Hsain, Brandon A. Krick   +7 more
openaire   +1 more source

Structural, Surface, and Optical Properties of AlN Thin Films Grown on Different Substrates by PEALD

Crystals, 2023
Plasma-enhanced atomic layer deposition was employed to grow aluminum nitride (AlN) thin films on Si (100), Si (111), and c-plane sapphire substrates at 250 °C. Trimethylaluminum and Ar/N2/H2 plasma were utilized as Al and N precursors, respectively. The
Sanjie Liu, Yangfeng Li, Jiayou Tao, Ruifan Tang, Xinhe Zheng   +4 more
doaj   +1 more source

Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT)

MATEC Web of Conferences, 2016
This paper presents the plasma-enhanced atomic layer deposition (PEALD) of titanium nitride (TiN) using the organic precursor tetrakis(ethylmethylamido)titanium (TEMAT), with remote ammonia (NH3) plasma as reactant gas.
Chen Z.X., Li X., Li W.-M., Lo G.-Q.
doaj   +1 more source

The role of plasma in plasma-enhanced atomic layer deposition of crystalline films

Journal of Vacuum Science & Technology A, 2020
The inclusion of plasma in atomic layer deposition processes generally offers the benefit of substantially reduced growth temperatures and greater flexibility in tailoring the gas-phase chemistry to produce specific film characteristics. The benefits plasmas provide, however, come at the cost of a complex array of process variables that often challenge
David R. Boris, Virginia D. Wheeler, Neeraj Nepal, Syed B. Qadri, Scott G. Walton, Charles (Chip) R. Eddy   +5 more
openaire   +1 more source

Ultra-thin aluminium oxide films deposited by plasma-enhanced atomic layer deposition for corrosion protection [PDF]

, 2011
We have employed plasma-enhanced and thermal atomic layer deposition (ALD) within the temperature range of 50–150°C for the deposition of ultra-thin (10–50 nm) Al2O3 films on 100Cr6 steel and aluminium Al2024-T3 alloys.
M. Fenker, B. Díaz, Potts, SE Stephen, Kessels, WMM Erwin, Swiatowska, J., Díaz, B., Tóth, L., Swiatowska, J, Schmalz, L, Radnóczi, G, Maurice, V., W. M. M. Kessels, Maurice, V, Seyeux, A., L. Tóth, S. E. Potts, Díaz, B, A. Seyeux, P. Marcus, Seyeux, A, V. Maurice, L. Schmalz, Tóth, L, Fenker, M, G. Radnóczi, Potts, S.E., Radnóczi, G., Marcus, P., Marcus, P, Fenker, M., Schmalz, L., Kessels, W.M.M., J. Światowska   +32 more
core   +2 more sources

Arginine methylation as a regulatory ratchet in cancer: From substrate selection to malignant‐state stabilization

Molecular Oncology, EarlyView.
Arginine methylation can be viewed as a persistence‐prone post‐translational modification regulated by a network of PRMTs. Competitive and compensatory interactions among PRMTs can redistribute methylation across substrate pools shaped by sequence, structural, spatial, and environmental layers, reinforcing RNA‐processing, chromatin, and signaling ...
So Hyun Kwon, Ji Min Lee
wiley   +1 more source

Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature [PDF]

ACS Applied Materials & Interfaces, 2019
A plasma-enhanced atomic layer deposition (PE-ALD) process to deposit metallic gold is reported, using the previously reported Me3Au(PMe3) precursor with H2 plasma as the reactant. The process has a deposition window from 50 to 120 °C with a growth rate of 0.030 ± 0.002 nm per cycle on gold seed layers, and it shows saturating behavior for both the ...
Michiel Van Daele, Matthew B. E. Griffiths, Ali Raza, Matthias M. Minjauw, Eduardo Solano, Ji-Yu Feng, Ranjith K. Ramachandran, Stéphane Clemmen, Roel Baets, Seán T. Barry, Christophe Detavernier, Jolien Dendooven   +11 more
openaire   +4 more sources

A new flow chip in combination with multiphoton microscopy as a protocol for longitudinal 3D imaging of tissue calcification under shear stress

FEBS Open Bio, EarlyView.
Miniaturized flow chip platform enabling continuous perfusion and longitudinal multiphoton 3D imaging of vascular smooth muscle cell constructs under physiological flow. Brightfield imaging guides region selection, while CellTracker Green and mRuby‐labeled fetuin‐A visualize cells and mineral deposition, respectively. Magnesium supplementation markedly
Vytautas Kučikas, Aaron D. Morgan, Ignas Čiurlionis, Christian Böhm, Stefan Jockenhövel, Willi Jahnen‐Dechent, Marc A. M. J. van Zandvoort   +6 more
wiley   +1 more source