Results 31 to 40 of about 5,793,656 (288)
Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS [PDF]
Materials, 2015 Adriana Szeghalmi, Andreas Tünnermann
exaly +2 more sources
Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films [PDF]
ECS Meeting Abstracts, 2013 Abstract not Available.
Ozgit-Akgun, Çağla +2 more
openaire +2 more sources
Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films [PDF]
, 2010 Many reported atomic layer deposition (ALD) processes are carried out at elevated temperatures (>150°C), which can be problematic for temperature-sensitive substrates.
Sanden, MCM Richard van de +11 more
core +2 more sources
Current Directions in Biomedical Engineering, 2021 High quality recording of neuronal activities and electrical stimulation require neurotechnical implants with appropriate electrode material. Iridium oxide (IrOx) is an excellent choice of material due to its biocompatibility, low electrochemical ...
Simon Nicolai +3 more
doaj +1 more source
Nanomaterials, 2023 In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al2O3 thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced.
João Chaves +6 more
doaj +1 more source
Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
Crystals, 2020 Direct plasma enhanced-atomic layer deposition (PE-ALD) is adopted for the growth of ZnO on c-Si with native oxide at room temperature. The initial stages of growth both in terms of thickness evolution and crystallization onset are followed ex-situ by a ...
Alberto Perrotta +4 more
doaj +1 more source
Journal of Materials Research and Technology, 2023 Aluminum nitride (AlN) film is a promising material which is used in various fields. In this study, AlN films with different plasma powers were grown by remote plasma atomic layer deposition.
Xiao-Ying Zhang +12 more
doaj +1 more source
Plasma Enhanced Atomic Layer Deposition of Tantalum (V) Oxide [PDF]
Coatings, 2021 The tantalum oxide thin films are promising materials for various applications: as coatings in optical devices, as dielectric layers for micro and nanoelectronics, and for thin-films solid-state lithium-ion batteries (SSLIBs). This article is dedicated to the Ta-O thin-film system synthesis by the atomic layer deposition (ALD) which allows to deposit ...
Pavel Fedorov +7 more
openaire +1 more source
The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
Nanomaterials, 2021 With the development of industrial civilization, advanced manufacturing technology has attracted widespread concern, including in the aerospace industry.
Guibai Xie +7 more
doaj +1 more source
Plasma atomic layer deposition [PDF]
, 2017 Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time during an excited species phase, wherein activated reactant is supplied such as from a plasma.
core +2 more sources