Growth of GaN Thin Films Using Plasma Enhanced Atomic Layer Deposition: Effect of Ammonia-Containing Plasma Power on Residual Oxygen Capture. [PDF]
Jiang S +9 more
europepmc +1 more source
Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process. [PDF]
Choi Y +6 more
europepmc +1 more source
Effect of Process Temperature on Density and Electrical Characteristics of Hf0.5Zr0.5O2 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition. [PDF]
Kim HG, Hong DH, Yoo JH, Lee HC.
europepmc +1 more source
Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells. [PDF]
Woo HJ +6 more
europepmc +1 more source
Superhigh energy storage density on-chip capacitors with ferroelectric Hf0.5Zr0.5O2/antiferroelectric Hf0.25Zr0.75O2 bilayer nanofilms fabricated by plasma-enhanced atomic layer deposition. [PDF]
He Y +5 more
europepmc +1 more source
Highly Homogeneous Current Transport in Ultra-Thin Aluminum Nitride (AlN) Epitaxial Films on Gallium Nitride (GaN) Deposited by Plasma Enhanced Atomic Layer Deposition. [PDF]
Schilirò E +12 more
europepmc +1 more source
Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO2 Coating. [PDF]
Chiappim W +10 more
europepmc +1 more source
Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry. [PDF]
Kilic U +9 more
europepmc +1 more source
Plasma enhanced atomic layer deposition of plasmonic TiN ultrathin films using TDMATi and NH3. [PDF]
Hansen K, Cardona M, Dutta A, Yang C.
europepmc +1 more source
Plasma-Enhanced Atomic Layer Deposition Synthesis of Nanolayered Molybdenum Diselenide (MoSe<sub>2</sub>) Thin Films for Nanoelectronics. [PDF]
Sanchez F +9 more
europepmc +1 more source

