Results 21 to 30 of about 360 (212)
Current Directions in Biomedical Engineering, 2021 High quality recording of neuronal activities and electrical stimulation require neurotechnical implants with appropriate electrode material. Iridium oxide (IrOx) is an excellent choice of material due to its biocompatibility, low electrochemical ...
Simon Nicolai +3 more
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Nanomaterials, 2023 In the presented study, a novel approach for thermal atomic layer deposition (ALD) of Al2O3 thin films using plasma-activated water (PAW) as a co-reactant, replacing traditionally employed deionized (DI) water, is introduced.
João Chaves +6 more
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Initial Growth and Crystallization Onset of Plasma Enhanced-Atomic Layer Deposited ZnO
Crystals, 2020 Direct plasma enhanced-atomic layer deposition (PE-ALD) is adopted for the growth of ZnO on c-Si with native oxide at room temperature. The initial stages of growth both in terms of thickness evolution and crystallization onset are followed ex-situ by a ...
Alberto Perrotta +4 more
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The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology
Nanomaterials, 2021 With the development of industrial civilization, advanced manufacturing technology has attracted widespread concern, including in the aerospace industry.
Guibai Xie +7 more
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Journal of Materials Research and Technology, 2023 Aluminum nitride (AlN) film is a promising material which is used in various fields. In this study, AlN films with different plasma powers were grown by remote plasma atomic layer deposition.
Xiao-Ying Zhang +12 more
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Plasma-enhanced atomic layer deposition for plasmonic TiN (Erratum) [PDF]
Nanophotonic Materials XIII, 2020 Publisher’s Note: This paper, originally published on 3 October 2016, was replaced with a corrected version on 12 May 2020. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance.
Lauren M. Otto +7 more
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Structural, Surface, and Optical Properties of AlN Thin Films Grown on Different Substrates by PEALD
Crystals, 2023 Plasma-enhanced atomic layer deposition was employed to grow aluminum nitride (AlN) thin films on Si (100), Si (111), and c-plane sapphire substrates at 250 °C. Trimethylaluminum and Ar/N2/H2 plasma were utilized as Al and N precursors, respectively. The
Sanjie Liu +4 more
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Plasma-Enhanced Atomic Layer Deposition-Based Ferroelectric Field-Effect Transistors
IEEE Journal of the Electron Devices SocietyThe use of the plasma-enhanced atomic layer deposition (ALD) technique for the deposition of HfO2-based ferroelectrics has received attention in recent years primarily due to wake-up free operation.
Chinsung Park +13 more
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Nanomaterials, 2021 Plasma-enhanced atomic layer deposition (PEALD) of TiN thin films were investigated as an effective Se diffusion barrier layer for Cu (In, Ga) Se2 (CIGS) solar cells.
Hyun-Jae Woo +6 more
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Plasma-enhanced atomic layer deposition of vanadium nitride
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2019 This work describes process development and associated characterization of a plasma-enhanced atomic layer deposition process for vanadium nitride (VN) using tetrakis(dimethylamido)vanadium and nitrogen plasma over a deposition temperature range from 150 to 300 °C.
Alexander C. Kozen +7 more
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