Results 51 to 60 of about 5,793,656 (288)

Passivation effects of atomic-layer-deposited aluminum oxide

EPJ Photovoltaics, 2013
Atomic-layer-deposited (ALD) aluminum oxide (Al2O3) has recently demonstrated an excellent surface passivation for both n- and p-type c-Si solar cells thanks to the presence of high negative fixed charges (Qf ~ 1012−1013 cm-2) in combination with a low ...
Kotipalli R., Delamare R., Poncelet O., Tang X., Francis L. A., Flandre D.   +5 more
doaj   +1 more source

Optimal Aluminum Doping Method in PEALD for Designing Outstandingly Stable InAlZnO TFT

Advanced Materials Interfaces, 2023
Oxide semiconductors are promising semiconducting materials for next‐generation thin‐film transistors (TFTs). The role of the cations should be considered in the design of oxide semiconductors suitable for various applications. Ga has been widely used as
Namgyu Woo, Seong‐In Cho, Sang‐Hee Ko Park   +2 more
doaj   +1 more source

Protocol for quantifying miRNA trafficking across the endosomal membrane

FEBS Open Bio, EarlyView.
An in vitro protocol measures miRNA uptake into endosomes isolated from mammalian cell extracts, which are free of subcellular contaminants. Performed at 37 °C in the presence of ATP, it ensures the import of single‐stranded miRNA into the endosomal lumen.
Syamantak Ghosh, Kamalika Mukherjee, Suvendra N. Bhattacharyya   +2 more
wiley   +1 more source

Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell

AIP Advances, 2013
We studied the tuning of structural and optical properties of ZnO thin film and its correlation to the efficiency of inverted solar cell using plasma-enhanced atomic layer deposition (PEALD).
Mi-jin Jin, Junhyeon Jo, Guru P. Neupane, Jeongyong Kim, Ki-Seok An, Jung-Woo Yoo   +5 more
doaj   +1 more source

Plasma-assisted atomic layer deposition: basics, opportunities and challenges [PDF]

, 2011
Plasma-assisted atomic layer deposition (ALD) is an energy-enhanced method for the synthesis of ultra-thin films with Å-level resolution in which a plasma is employed during one step of the cyclic deposition process.
Profijt, HB Harald, Sanden, MCM Richard van de, Potts, SE Stephen, Kessels, WMM Erwin, Kessels, WMM, H. B. Profijt, Potts, SE, Potts, S.E., W. M. M. Kessels, M. C. M. van de Sanden, S. E. Potts, Kessels, W.M. M., Van De Sanden, MCM, van de Sanden, M.C. M., Profijt, H.B., Potts, S. E., Sanden, van de, M.C.M., Profijt, H. B., Kessels, W.M.M., Profijt, HB, Kessels, W. M. M.   +20 more
core   +2 more sources

Thermodynamic Pathways of Nonequilibrium Solidification in Wire‐Arc Additive Manufacturing Fe‐Based Multicomponent Alloy Structures

Advanced Engineering Materials, EarlyView.
Geometry‐driven thermal behavior in wire‐arc additive manufacturing (WAAM) influences microstructural evolution during nonequilibrium solidification of a chemically complex Fe–Cr–Nb–W–Mo–C nanocomposite system. By comparing different deposits configurations, distinct entropy–cooling rate correlations, segregation, and carbide evolution are revealed ...
Blanca Palacios, Anthony Gonzalez, Aleksander Aleman, Tyler Dolmetsch, Tanaji Paul, Arvind Agarwal   +5 more
wiley   +1 more source

Reducing the Process Energy through Applying Plasma in Atomic Layer Deposition of Solid Oxide Fuel Cell Electrolyte [PDF]

한국정밀공학회지, 2019
The energy saving effect of reactant plasma in Atomic Layer Deposition (ALD) of ultrathin solid oxide fuel cell electrolyte was examined by measuring electrical current in real time.
Sanghoon Ji
doaj   +1 more source

Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films [PDF]

, 2018
Niobium pentoxide was deposited using tBuN=Nb(NEt2)3 as niobium precursor by both thermal atomic layer deposition (ALD) and plasma-enhanced atomic layer deposition (PE-ALD) with H2O and O2 plasma as coreactants, respectively.
Bol, AA Ageeth, Melskens, J., Kessels, WMM Erwin, Saravana Balaji Basuvalingam, Wilhelmus M. M. (Erwin) Kessels, Basuvalingam, SB, Bart Macco, Jimmy Melskens, Macco, B., Ageeth A. Bol, Bol, A.A., Macco, B Bart, Knoops, H.C.M.; id_orcid, Knoops, H.C.M., Harm C. M. Knoops, Melskens, J Jimmy, Knoops, HCM Harm, Kessels, W.M.M., Basuvalingam, S.B.   +18 more
core   +3 more sources

Affecting the Properties of Copper–Graphene Electroconductive Composite by Severe Plastic Deformation

Advanced Engineering Materials, EarlyView.
Copper‐based composites enhanced with carbon feature convenient mechanical properties and favorable electric conductivity. Processing via deformation and thermomechanical treatments can introduce advantageous microstructures further enhancing their performance. Herein, copper–graphene powder‐based composites are directly consolidated via rotary swaging
Radim Kocich, Lenka Kunčická, Pavel Czernek, Zifan Wang   +3 more
wiley   +1 more source

Plasma-Enhanced Atomic Layer Deposition of Hematite for Photoelectrochemical Water Splitting Applications

Crystals
Hematite (α-Fe2O3) is one of the most promising and widely used semiconductors for application in photoelectrochemical (PEC) water splitting, owing to its moderate bandgap in the visible spectrum and earth abundance.
Thom R. Harris-Lee, Andrew Brookes, Jie Zhang, Cameron L. Bentley, Frank Marken, Andrew L. Johnson   +5 more
doaj   +1 more source