Results 61 to 70 of about 462 (165)
Energy-Accuracy Trade-Offs for Resistive In-Memory Computing Architectures
Resistive in-memory computing (IMC) architectures currently lag behind SRAM IMCs and digital accelerators in both energy efficiency and compute density due to their low compute accuracy.
Saion K. Roy, Naresh R. Shanbhag
doaj +1 more source
Lead‐free bismuth halide perovskite memristors exhibit stable low‐voltage resistive switching behavior. The conductance‐activated quasi‐linear memristor model quantitatively reproduces the experimental hysteresis, confirming ion migration‐driven filament dynamics.
So‐Yeon Kim +4 more
wiley +1 more source
Effect of Programming Schemes on Short-Term Instability in 1T1R Configuration
Short-term instability is one of the key challenges for redox-based resistive random-access memory (ReRAM) reaching practical applications in the field of neuromorphic computing.
Xiaohua Liu +7 more
doaj +1 more source
Ultralow Voltage Resistive Switching in Hafnium–Zirconium Oxide
Ultralow SET and RESET voltage are essential for high‐density, low‐power, and small heat dissipation nonvolatile random‐access memory (NVRAM) elements.
M. Asif, Rajib K. Rakshit, Ashok Kumar
doaj +1 more source
Effects of oxygen and moisture on the I-V characteristics of TiO2 thin films
Current-voltage (I-V) characteristics well reveal the resistive switching performance of materials promising for the next-generation memory-resistance random access memory (ReRAM).
Wanheng Lu +3 more
doaj +1 more source
Honey-ReRAM Enabled Sustainable Edge AI System for IoT Applications
This paper is toward a promising solution to address the environmental sustainability challenge in computing by building brain-inspired and green non-Von Neumann systems with Resistive Random-Access Memory (ReRAM) made from natural organic materials ...
Jinhui Wang +5 more
doaj +1 more source
CMOS‐Compatible HfOx‐Based Radiation Hardening Component for Neuromorphic Computing Applications
HfOx‐based resistive random‐access‐memory (ReRAM) devices (TiN/Ti/HfOx/RuOx/TiN) are fabricated by CMOS‐compatible materials (ruthenium (Ru)) and lithography‐lite process, potentially enabling a maskless, etching‐free process that can be implemented in ...
Yao‐Feng Chang +3 more
doaj +1 more source
NbO2 has the potential for a variety of electronic applications due to its electrically induced insulator-to-metal transition (IMT) characteristic. In this study, we find that the IMT behavior of NbO2 follows the field-induced nucleation by investigating
Jaehyuk Park +5 more
doaj +1 more source
Corrosion Hammer: a self-activated bit-flip attack to the processing-in-memory accelerator
The Resistive Random-Access-Memory (ReRAM) crossbar-based Processing-In-Memory (PIM) accelerator shows great promise in accelerating neural networks (NNs).
Zihao Yang +6 more
doaj +1 more source
ReRAM/CMOS Array Integration and Characterization via Design of Experiments
No two fabricated Resistive Random Access Memory (ReRAM) devices are alike. Each device can have its own individual optimal set of operating parameters that gives the best performance.
Imtiaz Hossen +7 more
doaj +1 more source

