Results 161 to 170 of about 5,171 (275)

Analysis of Punch-Through Breakdown Voltages in 3C-SiC Schottky Barrier Diode Using Gaussian Profile for 200µm Thick Wafers

open access: yes, 2014
ME, ECEDNormally Schottky Barrier diodes are designed by using a uniform doping profile of the semiconductor material used. However, the higher breakdown voltage can be achieved by using non-uniform doping profiles, namely, linearly graded profile ...
Nishad, Pratibha
core  

Efficient and Durable Semitransparent Perovskite Solar Cells for the Application in 4T Perovskite/c‐Si Tandem Devices

open access: yesProgress in Photovoltaics: Research and Applications, Volume 34, Issue 7, Page 887-905, July 2026.
We present an optimized fabrication strategy incorporating a solution‐processed SnO2 buffer layer that prevents sputter‐induced damage during TCO deposition, enabling semitransparent perovskite solar cells with 21.87% efficiency, 27.15% in tandem, and exceptional long‐term stability under continuous illumination and outdoor conditions.
Satish Bykkam   +12 more
wiley   +1 more source

Cross‐Layer Molecular Design for Coherent Interface Passivation in Rigid and Flexible Perovskite Solar Cells

open access: yesAdvanced Functional Materials, Volume 36, Issue 44, 1 June 2026.
A cross‐layer passivation strategy employing molecularly designed thiazol‐5‐ylmethanamine hydrochloride (TMACl) enables coherent defect regulation at the SnO2/perovskite interface, stabilizes both layers, promotes phase‐pure α‐FAPbI3 formation, and enhances charge extraction, delivering PCEs of 26.44% in rigid and 24.72% in flexible perovskite solar ...
Fan Shen   +16 more
wiley   +1 more source

Photoconductive Gain Behavior of Ni/β-Ga2O3 Schottky Barrier Diode-Based UV Detectors. [PDF]

open access: yesMicromachines (Basel)
Kopyev VV   +4 more
europepmc   +1 more source

Impact of Oxygen Plasma Pre‐Treatment on Thermal Oxidation and Reliability of SiO2 on 4H‐SiC

open access: yesAdvanced Materials Interfaces, Volume 13, Issue 11, 9 June 2026.
We investigate how oxygen plasma pre‐treatment affects the thermal oxidation of silicon carbide. While plasma modification increases growth rates by 84%, it reduces dielectric breakdown strength by 18%. Our findings reveal that although plasma improves the interface state density, it introduces structural damage, highlighting a critical trade‐off ...
Chezhiyan Nanjappan   +3 more
wiley   +1 more source

Enhancing Stability of Few‐Layer Black Phosphorus (FLBP) Through Nitrocellulose Coating: A Robust Defense Mechanism Against Degradation

open access: yesAdvanced Materials Interfaces, Volume 13, Issue 11, 9 June 2026.
In this research, a simple and scalable strategy for protection of a few‐layer black phosphorus (FLBP) with a cellulose nitrate‐based material is presented. The FLBP is structurally and morphologically characterized. The FLBP stability with and without nitrocellulose protection is monitored by interferometric method, surface profile examination, and ...
Paweł Jakóbczyk   +8 more
wiley   +1 more source

Schottky Barrier Engineering in n‐Type Organic Source‐Gated Transistors Enabling High Conductance

open access: yesAdvanced Materials Technologies, Volume 11, Issue 11, 5 June 2026.
This study introduces a modified source electrode architecture for n‐type organic source‐gated transistors (OSGTs). By integrating Schottky and Ohmic contact regions, the design achieves a thinner depletion envelope, enhancing mobility nearly tenfold and reducing threshold voltage.
Yonghee Kim   +4 more
wiley   +1 more source

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