Results 11 to 20 of about 47,292 (298)
Following the successful experimental synthesis of single-layer metallic 1T-TaS2 and semiconducting 2H-MoS2, 2H-WSe2, we perform a first-principles study to investigate the electronic and interfacial features of metal/semiconductor 1T-TaS2/2H-MoS2 and 1T-
Xiangjiu Zhu +8 more
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Two-dimensional (2D) transition metal dichalcogenides with intrinsically passivated surfaces are promising candidates for ultrathin optoelectronic devices that their performance is strongly affected by the contact with the metallic electrodes.
Yu Lan +6 more
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A practical model, adequate for full reproduction of inhomogeneous Schottky diodes' forward characteristics over wide high-temperature and bias ranges, is proposed.
Gheorghe Brezeanu +5 more
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Fundamentals of low-resistive 2D-semiconductor metal contacts: an ab-initio NEGF study
Metal contacts form one of the main limitations for the introduction of 2D materials in next-generation scaled devices. Through ab-initio simulation techniques, we shed light on the fundamental physics and screen several 2D and 3D top and side contact ...
Rutger Duflou +3 more
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A 27 nm gate oxide thickness has been successfully used for manufacturing high performance 650V 4H-SiC planar-gate, inversion-channel power JBSFETs in a 6-inch commercial foundry with three (Linear, Hexagonal, and Octagonal) cell topologies.
Aditi Agarwal, Kijeong Han, B. J. Baliga
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Rectifying Schottky Contact in ZrN/Polycrystalline p-Ge
Fermi-level pinning (FLP) at the metal/Ge interface makes it difficult to control the Schottky barrier height, which forces an ohmic behavior on p-Ge and a rectifying behavior on n-Ge.
Kenta Moto +5 more
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Electrical characteristics of Al contact to NiSi using thin W layer as a barrier [PDF]
We show that the thermal instability that is observed in Schottky diodes with an Al film on NiSi contact to can be removed by introducing a very thin (~250 Å) tungsten film between the Al and the NiSi layers.
Bartur, M., Nicolet, M-A.
core +1 more source
Carbon nanotubes (CNTs) are promising materials for gas sensing because of their large specific area and high sensitivity to charge differentiation.
Shota Nakahara +5 more
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Plasma-etch-free β-Ga2O3–NiO–PtOx merged PiN Schottky diode with high-voltage stress reliability [PDF]
A gallium oxide (Ga2O3)–nickel oxide (NiO) merged PiN Schottky (MPS) diode was fabricated using Ga flux plasma-free etch and platinum oxide (PtOx) contacts.
Marko J. Tadjer +13 more
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Schottky barrier heights and electronic transport in Ga2O3 Schottky diodes
The Schottky contact, formed at the interface between a metal and a semiconductor, is instrumental in defining the electrical properties of Schottky barrier diodes (SBDs).
Min-Yeong Kim +5 more
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