Results 11 to 20 of about 812 (165)
Fabrication of Submicron Beams with Galvanic Etch Stop for Si in TMAH [PDF]
Sensors, 2009 A novel method has been developed to fabricate submicron beams with galvanic etch stop for Si in TMAH. The different Au:Si area ratios before and after the release of the beams are used to trigger the galvanic etch stop to fabricate submicron single ...
Yuelin Wang +5 more
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Vertical Etching of Scandium Aluminum Nitride Thin Films Using TMAH Solution
Nanomaterials, 2023 A wide bandgap, an enhanced piezoelectric coefficient, and low dielectric permittivity are some of the outstanding properties that have made ScxAl1−xN a promising material in numerous MEMS and optoelectronics applications.
A. S. M. Zadid Shifat +6 more
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Nanomaterials, 2019 We demonstrated that the tetramethylammonium hydroxide (TMAH) solution possesses different etching abilities to the chip sidewalls with different orientations because the orientation of chip sidewall determines the exposed crystallographic plane of ...
Hui Wan +5 more
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Effective suppression of interface states in recessed-gate MIS-HEMTs by TMAH wet etching
Applied Physics Express, 2023 The effect of tetramethylammonium hydroxide (TMAH) treatment prior to gate dielectric deposition on the performance of recessed-gate AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors (MIS-HEMTs) was investigated.
Yu Li +11 more
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Nanomaterials, 2021 The tetramethylammonium hydroxide (TMAH)-controlled alkaline etching of nickel hexacyanoferrate (NiHCF) mesocrystals is explored. The alkaline etching enables the formation of hollow framework structures with an increased surface area, the exposure of ...
Sascha Keßler +3 more
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Two-step Fabrication of Large Area SiO2/Si Membranes
Medžiagotyra, 2012 Two-step fabrication technique of SiO2/Si membrane combining the deep local etching of double side polished and thermally oxidized silicon <100> wafer in tetramethylammonium hydroxide (TMAH) water solution and SF6/O2 reactive ion etching is ...
Viktoras GRIGALIŪNAS +7 more
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Fabrication of Sio2-based microcantilevers by anisotropic chemical etching of (100) single crystal Si [PDF]
Journal of the Serbian Chemical Society, 2007 The undercutting process of thermal SiO2 microcantilevers with different orientations on (100) Si wafer was studied. The silicon substrate was removed by anisotropic chemical etching with a 25 wt. % aqueous solution of TMAH or a 30 wt.
Jović Vesna +3 more
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Beilstein Journal of Nanotechnology, 2016 The optimization of etchant parameters in wet etching plays an important role in the fabrication of semiconductor devices. Wet etching of tetramethylammonium hydroxide (TMAH)/isopropyl alcohol (IPA) on silicon nanowires fabricated by AFM lithography is ...
Siti Noorhaniah Yusoh +1 more
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Enhanced Light Extraction of Flip-Chip Mini-LEDs with Prism-Structured Sidewall
Nanomaterials, 2019 Current solutions for improving the light extraction efficiency of flip-chip light-emitting diodes (LEDs) mainly focus on relieving the total internal reflection at sapphire/air interface, but such methods hardly affect the epilayer mode photons.
Bin Tang +6 more
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Nanomaterials, 2020 The optimization of mesa etch for a quasi-vertical gallium nitride (GaN) Schottky barrier diode (SBD) by inductively coupled plasma (ICP) etching was comprehensively investigated in this work, including selection of the etching mask, ICP power, radio ...
Yue Sun +7 more
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