Results 11 to 20 of about 3,921 (200)

Pilot-Scale Experiences with Aerobic Treatment and Chemical Processes of Industrial Wastewaters from Electronics and Semiconductor Industry

open access: yesEnergies, 2021
TMAH is quaternary ammonium salt, consists of a methylated nitrogen molecule, and is widely used in the electronics industry as a developer and silicon etching agent. This substance is toxic and fatal if ingested. It can also cause skin burns, eye damage,
Valentina Innocenzi   +3 more
doaj   +1 more source

Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt.% TMAX [PDF]

open access: yesHemijska Industrija, 2021
In this paper, fabrication of silicon microchannels with integrated obstacles by using 25 wt.% tetramethylammonium hydroxide (TMAH) aqueous solution at the temperature of 80°C is presented and analysed.
Smiljanić Milče M.   +7 more
doaj   +1 more source

Recrystallized parylene as a mask for silicon chemical etching [PDF]

open access: yes, 2008
This paper presents the first use of recrystallized parylene as masking material for silicon chemical etch. Recrystallized parylene was obtained by melting parylene C at 350°C for 2 hours.
Kuo, Wen-Cheng   +3 more
core   +2 more sources

Insights Into the Influence of Sidewall Morphology on the Light Extraction Efficiency of Mini-LEDs

open access: yesIEEE Photonics Journal, 2019
We systemically investigated the influence of sidewall morphology change based on TMAH etching on the optical performance of mini-LEDs. The dominant feature of prism structures on the sidewall of mini-LEDs with TMAH etching treatment varied from ...
Bin Tang   +5 more
doaj   +1 more source

Environmentally Benign Formation of Nickel Hexacyanoferrate-Derived Mesoframes for Heterogeneous Catalysis

open access: yesNanomaterials, 2021
The tetramethylammonium hydroxide (TMAH)-controlled alkaline etching of nickel hexacyanoferrate (NiHCF) mesocrystals is explored. The alkaline etching enables the formation of hollow framework structures with an increased surface area, the exposure of ...
Sascha Keßler   +3 more
doaj   +1 more source

Design, fabrication, and testing of silicon microgimbals for super-compact rigid disk drives [PDF]

open access: yes, 1995
This paper documents results related to design optimization, fabrication process refinement, and micron-level static/dynamic testing of silicon micromachined microgimbals that have applications in super-compact computer disk drives as well as many other ...
Hsieh, Wen H.   +4 more
core   +1 more source

Revealing the Role of Sidewall Orientation in Wet Chemical Etching of GaN-Based Ultraviolet Light-Emitting Diodes

open access: yesNanomaterials, 2019
We demonstrated that the tetramethylammonium hydroxide (TMAH) solution possesses different etching abilities to the chip sidewalls with different orientations because the orientation of chip sidewall determines the exposed crystallographic plane of ...
Hui Wan   +5 more
doaj   +1 more source

Effective suppression of interface states in recessed-gate MIS-HEMTs by TMAH wet etching

open access: yesApplied Physics Express, 2023
The effect of tetramethylammonium hydroxide (TMAH) treatment prior to gate dielectric deposition on the performance of recessed-gate AlGaN/GaN metal-insulator-semiconductor high electron mobility transistors (MIS-HEMTs) was investigated.
Yu Li   +11 more
doaj   +1 more source

Ultra-thin silicon based piezoelectric capacitive tactile sensor [PDF]

open access: yes, 2016
This paper presents an ultra-thin bendable silicon based tactile sensor, in a piezoelectric capacitor configuration, realized by wet anisotropic etching as post-processing steps.
Dahiya, Ravinder   +4 more
core   +1 more source

Fabrication of Sio2-based microcantilevers by anisotropic chemical etching of (100) single crystal Si [PDF]

open access: yesJournal of the Serbian Chemical Society, 2007
The undercutting process of thermal SiO2 microcantilevers with different orientations on (100) Si wafer was studied. The silicon substrate was removed by anisotropic chemical etching with a 25 wt. % aqueous solution of TMAH or a 30 wt.
Jović Vesna   +3 more
doaj   +3 more sources

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