Results 11 to 20 of about 103,452 (148)

New applications of silicon wet etching using tmah water solution for fabrication of mems sensors. [PDF]

, 2013
U ovom radu prikazani su razvoj i usavršavanje tehnološkog procesa vlažnoganizotropnog hemijskog nagrizanja silicijuma orijentacije (100) u vodenom rastvorutetrametil-amonijum hidroksida (TMAH) koncentracije 25 tež.
Smiljanić, Milče
core   +11 more sources

Integration of a microfluidic chip with multiplexed optical fluorescence detector through anisotropic etching of Si using Tetramethylammonium hydroxide (TMAH)

, 2016
Point of care testing (POCT) systems, are widely used to firstly, diagnose and secondly, monitor a number of illnesses and infectious diseases. This research aims to develop the integration between an optical fluorescence system and a microfluidic chip -
Changqing Liu (1249713), Sijung Hu (1250727), Hannah Robbins, Hannah Robbins (7206482), Tung T. Bui (7207244), Changqing Liu, Masahiro Aoyagi, Sijung Hu, Masahiro Aoyagi (2639044), Tung Bui   +9 more
core   +8 more sources

Dry etching and sputtering [PDF]

, 2003
Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and ...
Wilkinson, C.D.W., Rahman, M., M. Rahman, C. D. W. Wilkinson   +3 more
core   +2 more sources

Improved TMAH Si-etching solution without attacking exposed aluminum

, 2000
In this paper, an improved Tetramethyl Ammonium Hydroxide (TMAH) etching method is reported. The process features higher silicon etching rate and resulting in smooth silicon surface and at the same time, no significant aluminum etching is observed.
Yan, Gui zhen, Hsing, I. Ming, Chan, Philip C.H., Sharma, Rajnish K., Sin, Johnny K.O.   +4 more
core   +1 more source

An improved TMAH Si-etching solution without attacking exposed aluminum

, 2001
In MEMS fabrication technology, it is often desirable to etch silicon substrate or polysilicon sacrificial layer after metallization is completed. Most of the etching solution would attack the aluminum.
Wang, YY, Sin, JKO, Hsing, I. Ming, Hsing, IM, Guizhen Yan, Sharma, RK, Chan, Philip C.H., Rajnish K. Sharma, Wang, Yangyuan, Johnny K.O. Sin, Sharma, Rajnish K., Philip C.H. Chan, Yangyuan Wang, Yan, Guizhen, Yan, GZ, I-Ming Hsing, Chan, PCH, Sin, Johnny K.O.   +17 more
core   +1 more source

Nano field effect transistors as basic building blocks for sensing [PDF]

, 2008
SiNW FETs and CNT FETs have been studied as candidates for integrable biosensors. Both types show sensing capability, CNT FETs even for uncharged molecules.
Keller, Dino
core   +1 more source

Recent advances in polymeric chemically amplified positive resists: Materials and design strategies

Smart Molecules, EarlyView.
This review summarizes recent advances in the molecular design of positive chemically amplified resists, focusing on photoacid generators and polymer architectures. Key strategies for enhancing sensitivity—including self‐amplification effects, copolymerization of sensitive monomers, controlled polymerization, and photosensitized chemically amplified ...
Litao Zhou, Haoyuan Li, Jianhua Zhang, Hanshen Xin   +3 more
wiley   +1 more source

Chemical Etching of {hk0} Silicon Plates in EDP Part I: Experiments and Comparison with TMAH [PDF]

, 2000
This paper deals with the anisotropic chemical etching of various silicon plates etched in EDP. Changes with orientation in geometrical features of etched surface and in the etching shape of starting circular sections are systematically investigated ...
A. Charbonnieras, A. Charbonnieras, C. R. Tellier, C. R. Tellier, T. G. Leblois   +4 more
core   +1 more source

Vertical Etching of Scandium Aluminum Nitride Thin Films Using TMAH Solution

Nanomaterials, 2023
A wide bandgap, an enhanced piezoelectric coefficient, and low dielectric permittivity are some of the outstanding properties that have made ScxAl1−xN a promising material in numerous MEMS and optoelectronics applications. One of the substantial challenges of fabricating ScxAl1−xN devices is its difficulty in etching, specifically with higher scandium ...
A. S. M. Zadid Shifat, Isaac Stricklin, Ravi Kiran Chityala, Arjun Aryal, Giovanni Esteves, Aleem Siddiqui, Tito Busani   +6 more
openaire   +3 more sources

Systematic investigation of the diffraction efficiency of sub‐15 nm resolution soft X‐ray zone plates via simulation and measurement

Journal of Synchrotron Radiation, EarlyView.
This study presents systematic measurements and rigorous coupled‐wave analysis of relative and absolute diffraction efficiencies for sub‐15 nm soft X‐ray Fresnel zone plates. By decoupling intrinsic optical performance from practical beamline transmission losses, this work establishes a highly reliable metrology framework to support the development of ...
Qingyuan Mao, Yuchen Jiao, Liang Liu, Jingyuan Zhu, Li Jiang, Xiangzhi Zhang, Zhanshan Wang   +6 more
wiley   +1 more source