Results 31 to 40 of about 812 (165)

Design and Fabrication of Double-Layer Crossed Si Microchannel Structure

open access: yesMicromachines, 2021
A four-step etching method is used to prepare the double-layer cross Si microchannel structure. In the first etching step, a V-groove structure is etched on (100) silicon, and the top channel is formed after thermal oxidation with the depth of the ...
Yipeng Wang, Weijian Zhou, Tieying Ma
doaj   +1 more source

Low-loss slot waveguides with silicon (111) surfaces realized using anisotropic wet etching

open access: yesFrontiers in Materials, 2016
We demonstrate low-loss slot waveguides on silicon-on-insulator (SOI) platform. Waveguides oriented along the (11-2) direction on the Si (110) plane were first fabricated by a standard e-beam lithography and dry etching process.
Kapil Debnath   +7 more
doaj   +1 more source

Evolution of Si Crystallographic Planes-Etching of Square and Circle Patterns in 25 wt % TMAH

open access: yesMicromachines, 2019
Squares and circles are basic patterns for most mask designs of silicon microdevices. Evolution of etched Si crystallographic planes defined by square and circle patterns in the masking layer is presented and analyzed in this paper.
Milče M. Smiljanić   +4 more
doaj   +1 more source

Self‐Assembled Inorganic Nanomembrane Tubes: Rolled‐Up Piezoelectrics for Microacoustic Wave‐Based Actuators and Sensors

open access: yesAdvanced Materials, EarlyView.
This study demonstrates a self‐assembly process to generate free‐standing piezoelectric nanomembranes, forming ultracompact microtubular acoustic wave sensors and actuators. The miniaturized 3D piezoelectric platform reported in this work can be applied in telecommunication, energy harvesting, and acoustofluidics. Moreover, the 3D self‐assembly can add
Raphaël C. L‐M. Doineau   +9 more
wiley   +1 more source

Spin‐On SiOx‐Assisted Inkjet Printing for Interdigitated n+ and p+ Poly‐Si/SiOx Contacts in Silicon Solar Cells With Suppressed Unintended Doping

open access: yesAdvanced Materials Technologies, EarlyView.
This work presents an innovative spin‐on SiOx‐assisted inkjet‐printed approach to form localized n+ and p+ poly‐Si/SiOx passivating contacts for high‐efficiency silicon solar cells within a single‐annealing step. The developed process results in a well‐defined interdigitated doping pattern, with unintended doping and cross‐doping concentrations ...
Jiali Wang   +8 more
wiley   +1 more source

Enhancing Small Molecule Sensing With Aptameric Functionalized Nano Devices

open access: yesAdvanced Materials Technologies, EarlyView.
Unveiling an ultra‐sensitive, non‐invasive neurotransmitter sensor. For the first time, a nanoscale sensor for detecting an important neurotransmitter was demonstrated using micro‐electromechanical systems (MEMS) technology. Our approach utilized field‐effect transistor (FET)‐based readout to enable pico‐molar detection of biomarkers in sweat.
Thi Thanh Ha Nguyen   +11 more
wiley   +1 more source

Photolithographic Patterning of Colloidal Quantum Dots Enabled by Plasma‐Induced Ligand Polymerization

open access: yesAdvanced Materials Technologies, EarlyView.
Plasma‐induced ligand polymerization on colloidal quantum dots (QDs) renders them resistant to organic solvents, enabling conventional photoresist‐based photolithography. This approach achieves microscale patterning with feature sizes down to 3 µm, preserving the optical properties of the QDs and offering a simple and scalable route for QD‐based ...
Boram Kim, Jaehyeon Kim, Heeyeop Chae
wiley   +1 more source

Thickness‐Dependent Infrared Emissivity of Ultrathin Freestanding MoSiN Nanocomposite Membranes

open access: yesAdvanced Optical Materials, EarlyView.
ABSTRACT Metals and dielectrics show opposite trends in thickness‐dependent infrared emissivity: metallic films exhibit a rise in emissivity below a critical thickness, while dielectric films show a corresponding decline. For applications demanding both high emissivity and mechanical strength in membranes with nanoscale thickness, combining these ...
Reethu Sebastian   +3 more
wiley   +1 more source

Scaled-Down c-Si and c-SiGe Wagon-Wheels for the Visualization of the Anisotropy and Selectivity of Wet-Chemical Etchants

open access: yesNanoscale Research Letters, 2019
Wet etching offers an advantage as a soft, damage-less method to remove sacrificial material with close to nanometer precision which has become critical for the fabrication of nanoscale structures.
Antoine Pacco   +5 more
doaj   +1 more source

Zinc Sulfide Enabling Remarkable Surface Passivation of Crystalline Silicon

open access: yesAdvanced Energy Materials, EarlyView.
Polycrystalline ZnS films capped by Al2O3 provide outstanding surface passivation performance. The excellent lattice agreement between c‐Si and ZnS combined with a hydrogenation step result in extremely low interface state density (≈ 1×1010 cm−2 eV−1) and recombination current pre‐factor (1.0 fA/cm2), revealing a new passivation strategy for ...
Gabriel Bartholazzi   +5 more
wiley   +1 more source

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