Results 81 to 90 of about 1,083 (193)
Gate Field Plate Structure for Subthreshold Swing Improvement of Si Line-Tunneling FETs
Tunnel field-effect transistors (TFETs) are promising for use in ultralow-power applications owing to their distinct band-to-band tunneling operation.
Xiangzhan Wang +4 more
doaj +1 more source
Silicon tunnel FET with average subthreshold slope of 55 mV/dec at low drain currents
In this paper we present a silicon tunnel FET based on line-tunneling to achieve better subthreshold performance. The fabricated device shows an on-current of Ion = 2.55 × 10−7 A/µm at Vds = Von = Vgs − Voff = −0.5 V for an Ioff = 1 nA/µm and an average ...
S. Glass +13 more
core +1 more source
Silicon Nitride Resistive Memories
Amorphous SiNx is an attractive resistance switching material for ReRAM applications due to its physicochemical properties, such as humidity resistance, low oxygen diffusivity, and is used as a metal diffusion blocker. By modifying the ratio between N and Si atoms, the microstructure of the SiNx is affected, rendering it possible to change the ...
Alexandros‐Eleftherios Mavropoulis +7 more
wiley +1 more source
Performance Projections for a Reconfigurable Tunnel NanoFET
Theoretical performance projections of a reconfigurable tunnel (RT) field-effect transistor (FET) employing multiple parallel 1-D channels are given. The RT-nanoFET can be reconfigured on demand from pto n-type and from low power (LP) to high performance
Stefan Blawid +3 more
doaj +1 more source
Source doping profile design for Si and Ge tunnel FET
The source junction doping profile design for Si and Ge tunnel FET (TFET) is discussed and compared in this paper. By using Sentaurus TCAD tools with calibrated dynamic non-local band-to-band tunneling and non-local trap-assisted-tunneling models, it is ...
Chen, Shaowen +2 more
core +1 more source
ABSTRACT Machine learning and Artificial Intelligence (AI) tasks have stretched traditional hardware to its limits. In‐hardware computation is a novel approach that aims to run complex operations, such as matrix–vector multiplication, directly at the device level for increased efficiency.
Juan P. Martinez +10 more
wiley +1 more source
Comparative Analysis of Carrier Statistics on MOSFET and Tunneling FET Characteristics
This paper presents a comparison analysis of carrier statistics on numerical simulations of MOSFET and tunneling FET (TFET). While the MOSFET current characteristics are not sensitive to the carrier statistic utilized in the simulation, a detailed ...
Dan Li +5 more
doaj +1 more source
Capacitive, charge‐domain compute‐in‐memory (CIM) stores weights as capacitance,eliminating DC sneak paths and IR‐drop, yielding near‐zero standbypower. In this perspective, we present a device to systems level performance analysis of most promising architectures and predict apathway for upscaling capacitive CIM for sustainable edge computing ...
Kapil Bhardwaj +2 more
wiley +1 more source
A single grain boundary dopingless PNPN tunnel field effect transistor (TFET) on recrystallized polycrystalline silicon is studied by varying the position of the grain boundary in the channel.
Mamidala Saketh Ram, Dawit Burusie Abdi
doaj +1 more source
In this work, a single layer n-doped MoS2 and p-doped WTe2 based vertical heterojunction tunnel FET has been investigated through a well-organized quantum mechanical approach.
Tanmoy Kumar Paul +1 more
doaj +1 more source

