Results 21 to 30 of about 2,676 (201)

Recent Progress on 3D NAND Flash Technologies [PDF]

open access: yesElectronics, 2021
Since 3D NAND was introduced to the industry with 24 layers, the areal density has been successfully increased more than ten times, and has exceeded 10 Gb/mm2 with 176 layers. The physical scaling of XYZ dimensions including layer stacking and footprint scaling enabled the density scaling. Logical scaling has been successfully realized, too.
Akira Goda
openaire   +2 more sources

Activation Enhancement and Grain Size Improvement for Poly-Si Channel Vertical Transistor by Laser Thermal Annealing in 3D NAND Flash [PDF]

open access: yesMicromachines, 2023
The bit density is generally increased by stacking more layers in 3D NAND Flash. Lowering dopant activation of select transistors results from complex integrated processes.
Tao Yang   +8 more
doaj   +2 more sources

Embodied Carbon Footprint of 3D NAND Memories

open access: yesProceedings of the 22nd ACM International Conference on Computing Frontiers: Workshops and Special Sessions
This study presents a novel model for estimating the embodied carbon footprint of Solid-State Drives (SSDs), focusing on the relationship between manufacturing complexity and environmental impact. By analyzing the number of process steps required to fabricate SSDs, particularly those using 3D NAND technology, the model predicts carbon emissions without
Olivier Weppe   +6 more
openaire   +3 more sources

Wordline Input Bias Scheme for Neural Network Implementation in 3D-NAND Flash [PDF]

open access: yesBiomimetics
In this study, we propose a neuromorphic computing system based on a 3D-NAND flash architecture that utilizes analog input voltages applied through wordlines (WLs).
Hwiho Hwang   +3 more
doaj   +2 more sources

Reliability of NAND Flash Memories: Planar Cells and Emerging Issues in 3D Devices

open access: yesComputers, 2017
We review the state-of-the-art in the understanding of planar NAND Flash memory reliability and discuss how the recent move to three-dimensional (3D) devices has affected this field.
Alessandro S Spinelli   +2 more
exaly   +3 more sources

Systematic Analysis of Spacer and Gate Length Scaling on Memory Characteristics in 3D NAND Flash Memory

open access: yesApplied Sciences
This study investigates the impact of oxide/nitride (ON) pitch scaling on the memory performance of 3D NAND flash memory. We aim to enhance 3D NAND flash memory by systematically reducing the spacer length (Ls) and gate length (Lg) to achieve improved ...
Hee Young Bae   +2 more
doaj   +2 more sources

Smart Electrical Screening Methodology for Channel Hole Defects of 3D Vertical NAND (VNAND) Flash Memory

open access: yesEng
In order to successfully achieve mass production in NAND flash memory, a novel test procedure has been proposed to electrically detect and screen the channel hole defects, such as Not-Open, Bowing, and Bending, which are unique in high-density 3D NAND ...
Beomjun Kim   +2 more
doaj   +2 more sources

Middle Interlayer Engineered Ferroelectric NAND Flash Overcoming Reliability and Stability Bottlenecks for Next‐Generation High‐Density Storage Systems [PDF]

open access: yesAdvanced Science
Multilevel storage and low‐voltage operation position ferroelectric transistors as promising candidates for next‐generation nonvolatile memory. Among them, gate‐injection‐type ferroelectric transistors offer improved vertical scalability and power ...
Giuk Kim   +12 more
doaj   +2 more sources

Modeling methodology for thermo-structural analysis of V-NAND flash memory structure [PDF]

open access: yesScientific Reports
This study proposes modeling methodology based on a continuous model for conducting thermo-electric-structural analyses of V-NAND flash memory structure under the Joule heating effect.
Yongha Kim, Seungjun Ryu, Sungryung Lee
doaj   +2 more sources

Analysis of Residual Stresses Induced in the Confined 3D NAND Flash Memory Structure for Process Optimization

open access: yesIEEE Journal of the Electron Devices Society, 2022
In flash memory technology, mechanical stress is considered as one of the major factors that can influence the device performance. Furthermore, mechanical stress can have a greater impact on the electrical performance in 3D NAND than in 2D NAND because ...
Eun-Kyeong Jang   +4 more
doaj   +1 more source

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