Results 121 to 130 of about 4,190 (193)

A Novel Channel Preparation Scheme to Optimize Program Disturbance in Three-Dimensional NAND Flash Memory. [PDF]

Micromachines (Basel)
You K, Jin L, Jia J, Huo Z.
europepmc   +1 more source

Demonstration of In-Memory Biosignal Analysis: Novel High-Density and Low-Power 3D Flash Memory Array for Arrhythmia Detection. [PDF]

Adv Sci (Weinh)
Kim J, Im J, Shin W, Lee S, Oh S, Kwon D, Jung G, Choi WY, Lee JH.   +8 more
europepmc   +1 more source

Role of the channel on the memory window of HfZrO_x ferroelectric field-effect transistors with p-type Si-doped InZnO_x channel. [PDF]

Sci Rep
Park H, Lim S, Lee S, Lee JW, Woo J.
europepmc   +1 more source

Effects of Hydrolysis Reaction and Abrasive Drag Force Accelerator on Enhancing Si-Wafer Polishing Rate and Improving Si-Wafer Surface Roughness. [PDF]

Nanomaterials (Basel)
Jeon MU, Kim PS, Han MH, Lee SH, Lee HM, Kim SB, Park JH, Cho KC, Park J, Park JG.   +9 more
europepmc   +1 more source

Exploring the feasibility of real-time on-device ECG biometric classification using quantized neural networks. [PDF]

Front Digit Health
Berki M, Mateasik A, Micjan M, Vavrinsky E, Gasparek K, Cernaj L.   +5 more
europepmc   +1 more source

Bilayer LDPC Codes Combined with Perturbed Decoding for MLC NAND Flash Memory. [PDF]

Entropy (Basel)
Kong L, Liu H, Hou W, Meng C.
europepmc   +1 more source

Decoupling polarization and coercive field in AlScN/AlN/AlScN stack for enhanced performance in ferroelectric thin-film transistors. [PDF]

Nat Commun
Kim KD, Ryoo SK, Yeom MK, Lee SH, Choi W, Kim Y, Choi JH, Xin T, Cheng Y, Hwang CS.   +9 more
europepmc   +1 more source

Nanogate ferroelectric transistors with ultralow operation voltage of 0.6 V. [PDF]

Sci Adv
Meng D, Ma X, Shen Z, Xu L, Peng LM, Qiu C.   +5 more
europepmc   +1 more source

Investigating Floating-Gate Topology Influence on van der Waals Memory Performance. [PDF]

Nanomaterials (Basel)
Zheng H, Qin Y, Gao C, Fang J, Zou Y, Li M, Zhang J.   +6 more
europepmc   +1 more source

Electrically Active Defects and Traps and Their Relation to Stoichiometry and Chemical Environment in HfO₂/Al₂O₃ Dielectric Stacks as Revealed by XPS. [PDF]

Materials (Basel)
Spassov D, Paskaleva A, Avramova I, Wozniak W, Guziewicz E.   +4 more
europepmc   +1 more source