Results 21 to 30 of about 261,592 (260)

Characterization of Al2O3/4H-SiC and Al2O3/SiO2/4H-SiC MOS structures [PDF]

open access: yesBulletin of the Polish Academy of Sciences Technical Sciences, 2016
Abstract The paper presents the results of characterization of MOS structures with aluminum oxide layer deposited by ALD method on silicon carbide substrates. The effect of the application of thin SiO2 buffer layer on the electrical properties of the MOS structures with Al2O3 layer has been examined. Critical electric field values at the level of 7.5–8
A. Taube   +7 more
openaire   +1 more source

Defect characterization and charge transport measurements in high-resolution Ni/n-4H-SiC Schottky barrier radiation detectors fabricated on 250 μm epitaxial layers

open access: yesJournal of Applied Physics, 2021
Advances in the growth processes of 4H-SiC epitaxial layers have led to the continued expansion of epilayer thickness, allowing for the detection of more penetrative radioactive particles. We report the fabrication and characterization of high-resolution
Joshua W. Kleppinger   +3 more
semanticscholar   +1 more source

Anisotropic Defect Distribution in He+-Irradiated 4h-Sic: Effect of Stress on Defect Distribution

open access: yesActa Materialia, 2021
Irradiation-induced anisotropic swelling in hexagonal α-SiC is known to degrade the mechanical properties of SiC; however, the associated physical mechanism and microstructural process remain insufficiently understood.
Subing Yang   +3 more
semanticscholar   +1 more source

M-Center in Neutron-Irradiated 4H-SiC [PDF]

open access: yesCrystals, 2021
We report on the metastable defects introduced in the n-type 4H-SiC material by epithermal and fast neutron irradiation. The epithermal and fast neutron irradiation defects in 4H-SiC are much less explored compared to electron or proton irradiation-induced defects. In addition to the carbon vacancy (Vc), silicon vacancy (Vsi) and carbon antisite-carbon
Ivana Capan   +4 more
openaire   +4 more sources

Vibronic States and Their Effect on the Temperature and Strain Dependence of Silicon-Vacancy Qubits in 4H - SiC [PDF]

open access: yesPhysical Review Applied, 2020
Silicon-vacancy qubits in silicon carbide (SiC) are emerging tools in quantum technology applications due to their excellent optical and spin properties.
P. Udvarhelyi   +11 more
semanticscholar   +1 more source

Thermal Behaviors and Optical Parametric Oscillation in 4H‐Silicon Carbide Integrated Platforms

open access: yesAdvanced Photonics Research, 2021
4H‐silicon carbide (SiC) integrated platforms have shown great potential in quantum and nonlinear photonics. However, the thermal properties of 4H‐SiC waveguides are still unknown, even though thermo‐optic effects can play an important role in ...
Xiaodong Shi   +7 more
doaj   +1 more source

High Single-Event Burnout Resistance 4H-SiC Junction Barrier Schottky Diode

open access: yesIEEE Journal of the Electron Devices Society, 2021
This paper presents a single-event burnout (SEB) resistance method for 4H-SiC Junction Barrier Schottky Diode (JBS) under high bias voltage and linear energy transfer (LET) conditions.
Mao-Bin Li   +5 more
doaj   +1 more source

Spectroscopy studies of 4H-SiC [PDF]

open access: yesMaterials Research, 2003
Calculations of the total dielectric functions and the optical bandgap energy (OBGE) of 4HSiC were performed by the full-potential linear muffin-tin-orbital method. The results are compared to spectroscopic ellipsometry dielectric measurements agreeing closely over in a wide range of energies.
Oliveira, A.C. de   +12 more
openaire   +5 more sources

Relationship between electrical properties and interface structures of SiO2/4H-SiC prepared by dry and wet oxidation

open access: yesAIP Advances, 2019
We have investigated the relationship between the electrical properties and interfacial atomic structure of SiO2/4H-SiC interfaces, prepared by dry and wet thermal oxidation procedures with 4H-SiC (0001) and 4H-SiC (000-1) substrates, using extended x ...
Efi Dwi Indari   +4 more
doaj   +1 more source

Influences of Nonaqueous Slurry Components on Polishing 4H-SiC Substrate with a Fixed Abrasive Pad

open access: yesCrystals, 2023
4H-SiC wafers are more likely to sustain a lower material removal rate (MRR) and severe subsurface damage in conventional chemical mechanical polishing (CMP) methods.
Jiyuan Zhong   +6 more
doaj   +1 more source

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