Results 31 to 40 of about 19,738 (219)

Schottky Barrier Modulation of Metal/4H-SiC Junction with Thin Interface Spacer Driven by Surface Polarization Charge on 4H-SiC Substrate [PDF]

open access: yes, 2016
The Au/Ni/Al2O3/4H-SiC junction with the Al2O3 film as a thin spacer layer was found to show the electrical characteristics of a typical rectifying Schottky contact, which is considered to be due to the leakiness of the spacer layer. The Schottky barrier
Carter C. H.   +9 more
core   +1 more source

Spectroscopy studies of 4H-SiC [PDF]

open access: yesMaterials Research, 2003
Calculations of the total dielectric functions and the optical bandgap energy (OBGE) of 4HSiC were performed by the full-potential linear muffin-tin-orbital method. The results are compared to spectroscopic ellipsometry dielectric measurements agreeing closely over in a wide range of energies.
Oliveira, A.C. de   +12 more
openaire   +5 more sources

Isolated oxygen defects in 3C- and 4H-SiC: A theoretical study [PDF]

open access: yes, 2002
Ab initio calculations in the local-density approximation have been carried out in SiC to determine the possible configurations of the isolated oxygen impurity. Equilibrium geometry and occupation levels were calculated.
A. Gali   +38 more
core   +1 more source

Relationship between electrical properties and interface structures of SiO2/4H-SiC prepared by dry and wet oxidation

open access: yesAIP Advances, 2019
We have investigated the relationship between the electrical properties and interfacial atomic structure of SiO2/4H-SiC interfaces, prepared by dry and wet thermal oxidation procedures with 4H-SiC (0001) and 4H-SiC (000-1) substrates, using extended x ...
Efi Dwi Indari   +4 more
doaj   +1 more source

Influences of Nonaqueous Slurry Components on Polishing 4H-SiC Substrate with a Fixed Abrasive Pad

open access: yesCrystals, 2023
4H-SiC wafers are more likely to sustain a lower material removal rate (MRR) and severe subsurface damage in conventional chemical mechanical polishing (CMP) methods.
Jiyuan Zhong   +6 more
doaj   +1 more source

Effect of hexagonality on the pressure-dependent lattice dynamics of 4H-SiC

open access: yesNew Journal of Physics, 2022
The pressure-dependent lattice dynamics of 4H-SiC is investigated using diamond anvil cell, and compared with those of 3C- and 6H-SiC. It is found that both the zone-center longitudinal optical (LO) and transverse optical (TO) modes shift to higher ...
Junran Zhang   +9 more
doaj   +1 more source

The emergence of quantum capacitance in epitaxial graphene [PDF]

open access: yes, 2016
We found an intrinsic redistribution of charge arises between epitaxial graphene, which has intrinsically n-type doping, and an undoped substrate. In particular, we studied in detail epitaxial graphene layers thermally elaborated on C-terminated $4H ...
Cropper, P.   +6 more
core   +2 more sources

Valence band structure and band offset of 3C- and 4H-SiC studied by ballistic hole emission microscopy [PDF]

open access: yes, 2015
p-type Schottky barriers in Pt/3C-SiC contacts have been measured using ballistic hole emission microscopy (BHEM) and estimated to be ???0.06 eV higher than identically prepared Pt/p-type 4H-SiC contacts.
Ding, Y.   +4 more
core   +1 more source

In situ high-pressure spectroscopic studies using moissanite (4H-SiC) anvils

open access: yesAIP Advances, 2018
We examined the Raman scattering and IR absorption spectroscopy of 4H-SiC and its performance as an anvil material for high-pressure UV-visible absorption spectroscopic measurements.
Jinbo Zhang   +7 more
doaj   +1 more source

Leakage Current Behavior in HfO2/SiO2/Al2O3 Stacked Dielectric on 4H-SiC Substrate

open access: yesIEEE Journal of the Electron Devices Society, 2023
In this study, we investigate the deposition of high-k dielectric materials, namely Al2O3 and HfO2, using atomic layer deposition for 4H-SiC metal-oxide-semiconductor applications.
Hao Huang   +3 more
doaj   +1 more source

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