Results 11 to 20 of about 14,758 (228)

A Breakdown Voltage Multiplier for High Voltage Swing Drivers [PDF]

open access: yes, 2007
A novel breakdown voltage (BV) multiplier is introduced that makes it possible to generate high output voltage swings using transistors with low breakdown voltages. The timing analysis of the stage is used to optimize its dynamic response.
Hajimiri, Ali, Mandegaran, Sam
core   +1 more source

Equivalent model and limit for the SOI lateral power device using high-k dielectric

open access: yesResults in Physics, 2019
This paper presents a simple and clear equivalent model to investigate the SOI lateral power device using high-k dielectric (HK device). The proposed model can accurately characterize the electric field and facilitate the obtainment of optimal breakdown ...
Jiafei Yao   +5 more
doaj   +1 more source

Simulation, design and fabrication of large area implanted silicon two-dimensional position sensitive radiation detectors [PDF]

open access: yes, 1991
The fabrication process of a two-dimensional position sensitive radiation detector (2-D PSD) with a 4 cm2 active area is presented. Critical steps in the fabrication are emphasised.
Aïte, K.   +3 more
core   +2 more sources

Wide Bandgap Vertical kV-Class β-Ga₂O₃/GaN Heterojunction p-n Power Diodes With Mesa Edge Termination

open access: yesIEEE Journal of the Electron Devices Society, 2022
Breakdown capability of ${\beta }$ -Ga2O3/GaN heterojunction-based vertical p-n power diodes with mesa edge termination (ET) was comprehensively investigated using TCAD simulation.
Dinusha Herath Mudiyanselage   +2 more
doaj   +1 more source

Financial consulting in Ukraine [PDF]

open access: yes, 2013
Implantation-free 4H-SiC bipolar junction transistors with multiple-shallow-trench junction termination extension have been fabricated. The maximum current gain of 40 at a current density of 370 A/cm(2) is obtained for the device with an active area of 0.
Antoniuk, Yulia   +3 more
core   +2 more sources

Design and Optimization of Vertical GaN PiN Diodes With Fluorine-Implanted Termination

open access: yesIEEE Journal of the Electron Devices Society, 2020
Gallium nitride (GaN)-based power devices enable high power density and high switching frequency for power electronics systems. For the emerging vertical GaN devices, the electric field crowding around the edge of the main junction could result in ...
Yuxin Liu, Shu Yang, Kuang Sheng
doaj   +1 more source

Numerical investigation on L-shaped vertical field plate in high-voltage LDMOS

open access: yesResults in Physics, 2019
In this work, an L-shaped vertical field plate (LVFP) is introduced in high-voltage lateral double-diffused MOSFET (LDMOS). The LVFP is embedded in an oxide trench that penetrates into the drift region. Compared with the conventional vertical field plate
Yue Hu   +5 more
doaj   +1 more source

Optimal edge termination for high oxide reliability aiming 10kV SiC n-IGBTs [PDF]

open access: yes, 2019
The edge termination design strongly affects the ability of a power device to support the desired voltage and its reliable operation. In this paper we present three appropriate termination designs for 10kV n-IGBTs which achieve the desired blocking ...
,   +9 more
core   +1 more source

Improving Breakdown Voltage for a Novel SOI LDMOS with a Lateral Variable Doping Profile on the Top Interface of the Buried Oxide Layer

open access: yesAdvances in Condensed Matter Physics, 2015
In order to achieve a high breakdown voltage (BV) for the SOI (Silicon-On-Insulator) power device in high voltage ICs, a novel high voltage n-channel lateral double-diffused MOS (LDMOS) with a lateral variable interface doping profile (LVID) placed at ...
Jingjing Jin   +7 more
doaj   +1 more source

Numerical Investigation of Transient Breakdown Voltage Enhancement in SOI LDMOS by Using a Step P-Type Doping Buried Layer

open access: yesMicromachines, 2023
In this paper, the transient breakdown voltage (TrBV) of a silicon-on-insulator (SOI) laterally diffused metal-oxide-semiconductor (LDMOS) device was increased by introducing a step P-type doping buried layer (SPBL) below the buried oxide (BOX).
Xiaoming Yang   +4 more
doaj   +1 more source

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